Resist free patterning of nonpreferential buffer layers for block copolymer lithography

ACS Nano

Volumn 4, Issue 11, 2010, Pages 6527-6534

  Han, Eungnak ^a   Leolukman, Melvina ^a   Kim, Myungwoong ^a   Gopalan, Padma ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

Block copolymer; Direct patterning; Directed assembly; E beam lithography; Neutral surface

Indexed keywords

BLOCK COPOLYMER LITHOGRAPHY; BLOCK LENGTHS; CHEMICAL PATTERN; CONVENTIONAL LITHOGRAPHY; DIRECT PATTERNING; DIRECTED ASSEMBLY; DOMAIN ORIENTATION; E-BEAM LITHOGRAPHY; E-BEAM RESIST; LITHOGRAPHIC PROCESS; LOW MOLECULAR WEIGHT; MICRO-DOMAINS; NEUTRAL SURFACES; PERPENDICULAR ORIENTATION; SPATIAL CONTROL; SUBSTRATE INTERFACE; TOPDOWN;

BLOCK COPOLYMERS; BUFFER LAYERS; COPOLYMERIZATION; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ESTERS; OPTICAL WAVEGUIDES; PLASTIC PRODUCTS; POLYSTYRENES;

EPITAXIAL LAYERS;

EID: 78649576110     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn101616d     Document Type: Article

References (36)

1. Hawker, C. J.; Russell, T. P. Block Copolymer Lithography: Merging "Bottom-Up" with "Top Down" Processes MRS Bull. 2005, 30, 952-966
2. Segalman, R. A. Patterning with Block Copolymer Thin Films Mater. Sci. Eng., R 2005, 48, 191-226
3. Bang, J.; Jeong, U.; Ryu, D. Y.; Russell, T. P.; Hawker, C. J. Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns Adv. Mater. 2009, 21, 4769-4792
4. Hamley, I. W. Ordering in Thin Films of Block Copolymers: Fundamentals to Potential Applications Prog. Polym. Sci. 2009, 34, 1161-1210
5. Kim, H. C.; Park, S. M.; Hinsberg, W. D. Block Copolymer Based Nanostructures: Materials, Processes, and Applications to Electronics Chem. Rev. 2010, 110, 146-177
6. Ruiz, R.; Kang, H. M.; Detcheverry, F. A.; Dobisz, E.; Kercher, D. S.; Albrecht, T. R.; de Pablo, J. J.; Nealey, P. F. Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly Science 2008, 321, 936-939
7. Hong, A. J.; Liu, C. C.; Wang, Y.; Kim, J.; Xiu, F. X.; Ji, S. X.; Zou, J.; Nealey, P. F.; Wang, K. L. Metal Nanodot Memory by Self-Assembled Block Copolymer Lift-Off Nano Lett. 2010, 10, 224-229
8. Kim, M.; Safron, N. S.; Han, E.; Arnold, M. S.; Gopalan, P. Fabrication and Characterization of Large-Area, Semiconducting Nanoperforated Graphene Materials Nano Lett. 2010, 10, 1125-1131
9. Park, J. H.; Kirch, J.; Mawst, L. J.; Liu, C. C.; Nealey, P. F.; Kuech, T. F. Controlled Growth of InGaAs/InGaAsP Quantum Dots on InP Substrates Employing Diblock Copolymer Lithography Appl. Phys. Lett. 2009, 95, 113111
10. Kim, S. O.; Solak, H. H.; Stoykovich, M. P.; Ferrier, N. J.; de Pablo, J. J.; Nealey, P. F. Epitaxial Self-Assembly of Block Copolymers on Lithographically Defined Nanopatterned Substrates Nature 2003, 424, 411-414
11. Bita, I.; Yang, J. K. W.; Jung, Y. S.; Ross, C. A.; Thomas, E. L.; Berggren, K. K. Graphoepitaxy of Self-Assembled Block Copolymers on Two-Dimensional Periodic Patterned Templates Science 2008, 321, 939-943
12. Kim, S. H.; Misner, M. J.; Russell, T. P. Solvent-Induced Ordering in Thin Film Diblock Copolymer/Homopolymer Mixtures Adv. Mater. 2004, 16, 2119-2123
13. Sivaniah, E.; Hayashi, Y.; Iino, M.; Hashimoto, T.; Fukunaga, K. Observation of Perpendicular Orientation in Symmetric Diblock Copolymer Thin Films on Rough Substrates Macromolecules 2003, 36, 5894-5896
14. Yager, K. G.; Berry, B. C.; Page, K.; Patton, D.; Karim, A.; Amis, E. J. Disordered Nanoparticle Interfaces for Directed Self-Assembly Soft Matter 2009, 5, 622-628
15. Peters, R. D.; Yang, X. M.; Kim, T. K.; Sohn, B. H.; Nealey, P. F. Using Self-Assembled Monolayers Exposed to X-rays to Control the Wetting Behavior of Thin Films of Diblock Copolymers Langmuir 2000, 16, 4625-4631
16. Mansky, P.; Liu, Y.; Huang, E.; Russell, T. P.; Hawker, C. Controlling Polymer-Surface Interactions with Random Copolymer Brushes Science 1997, 275, 1458-1460
17. Suh, H. S.; Kang, H. M.; Liu, C. C.; Nealey, P. F.; Char, K. Orientation of Block Copolymer Resists on Interlayer Dielectrics with Tunable Surface Energy Macromolecules 2010, 43, 461-466
18. In, I.; La, Y. H.; Park, S. M.; Nealey, P. F.; Gopalan, P. Side-Chain-Grafted Random Copolymer Brushes as Neutral Surfaces for Controlling the Orientation of Block Copolymer Microdomains in Thin Films Langmuir 2006, 22, 7855-7860
19. Ji, S.; Liu, C. C.; Son, J. G.; Gotrik, K.; Craig, G. S. W.; Gopalan, P.; Himpsel, F. J.; Char, K.; Nealey, P. F. Generalization of the Use of Random Copolymers To Control the Wetting Behavior of Block Copolymer Films Macromolecules 2008, 41, 9098-9103
20. Han, E.; In, I.; Park, S. M.; La, Y. H.; Wang, Y.; Nealey, P. F.; Gopalan, P. Photopatternable Imaging Layers for Controlling Block copolymer microdomain orientation Adv. Mater. 2007, 19, 4448-4452
21. Edwards, E. W.; Montague, M. F.; Solak, H. H.; Hawker, C. J.; Nealey, P. F. Precise Control Over Molecular Dimensions of Block-Copolymer Domains Using the Interfacial Energy of Chemically Nanopatterned Substrates Adv. Mater. 2004, 16, 1315-1319
22. Park, S. H.; Shin, D. O.; Kim, B. H.; Yoon, D. K.; Kim, K.; Lee, S. Y.; Oh, S. H.; Choi, S. W.; Jeon, S. C.; Kim, S. O. Block Copolymer Multiple Patterning Integrated with Conventional ArF Lithography Soft Matter 2010, 6, 120-125
23. Shin, D. O.; Kim, B. H.; Kang, J. H.; Jeong, S. J.; Park, S. H.; Lee, Y. H.; Kim, S. O. One-Dimensional Nanoassembly of Block Copolymers Tailored by Chemically Patterned Surfaces Macromolecules 2009, 42, 1189-1193
24. Bates, F. S.; Fredrickson, G. H. Block Copolymer Thermodynamics-Theory and Experiment Annu. Rev. Phys. Chem. 1990, 41, 525-557
25. Russell, T. P.; Hjelm, R. P.; Seeger, P. A. Temperature-Dependence of the Interaction Parameter of Polystyrene and Poly(Methyl Methacrylate) Macromolecules 1990, 23, 890-893
26. Han, E.; Gopalan, P. Cross-Linked Random Copolymer Mats As Ultrathin Nonpreferential Layers for Block Copolymer Self-Assembly Langmuir 2010, 26, 1311-1315
27. Han, E.; Stuen, K. O.; La, Y. H.; Nealey, P. F.; Gopalan, P. Effect of Composition of Substrate-Modifying Random Copolymers on the Orientation of Symmetric and Asymmetric Diblock Copolymer Domains Macromolecules 2008, 41, 9090-9097
28. Bang, J.; Bae, J.; Lowenhielm, P.; Spiessberger, C.; Given-Beck, S. A.; Russell, T. P.; Hawker, C. J. Facile Routes to Patterned Surface Neutralization Layers for Block Copolymer Lithography Adv. Mater. 2007, 19, 4552-4557
29. Choi, J. O.; Moore, J. A.; Corelli, J. C.; Silverman, J. P.; Bakhru, H. Degradation of Poly(Methylmethacrylate) by Deep Ultraviolet, X-Ray, Electron-Beam, and Proton-Beam Irradiations J. Vac. Sci. Technol. B 1988, 6, 2286-2289
30. Rastogi, A.; Paik, M. Y.; Tanaka, M.; Ober, C. K. Direct Patterning of Intrinsically Electron Beam Sensitive Polymer Brushes ACS Nano 2010, 4, 771-780
31. Bosworth, J. K.; Black, C. T.; Obert, C. K. Selective Area Control of Self-Assembled Pattern Architecture Using a Lithographically Patternable Block Copolymer ACS Nano 2009, 3, 1761-1766
32. Bosworth, J. K.; Paik, M. Y.; Ruiz, R.; Schwartz, E. L.; Huang, J. Q.; Ko, A. W.; Smilgies, D. M.; Black, C. T.; Ober, C. K. Control of Self-Assembly of Lithographically Patternable Block Copolymer Films ACS Nano 2008, 2, 1396-1402
33. Segalman, R. A.; Yokoyama, H.; Kramer, E. J. Graphoepitaxy of Spherical Domain Block Copolymer Films Adv. Mater. 2001, 13, 1152-1155
34. Xiao, S. G.; Yang, X. M.; Edwards, E. W.; La, Y. H.; Nealey, P. F. Graphoepitaxy of Cylinder-Forming Block Copolymers for Use as Templates to Pattern Magnetic Metal Dot Arrays Nanotechnology 2005, 16, S324-S329
35. Park, S. M.; Stoykovich, M. P.; Ruiz, R.; Zhang, Y.; Black, C. T.; Nealey, P. E. Directed Assembly of Lamellae-Forming Block Copolymers by Using Chemically and Topographically Patterned Substrates Adv. Mater. 2007, 19, 607-611
36. Jakubowski, W.; Lutz, J. F.; Slomkowski, S.; Matyjaszewski, K. Block and Random Copolymers as Surfactants for Dispersion Polymerization. I. Synthesis via Atom Transfer Radical Polymerization and Ring-Opening Polymerization J. Polym. Sci., Part A: Polym. Chem. 2005, 43, 1498-1510 (Pubitemid 40496623)