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Volumn 16, Issue 4, 2013, Pages 117-122

Direct writing via electron-driven reactions

Author keywords

[No Author keywords available]

Indexed keywords

COMPLEX PATTERN; DIRECT WRITING; DIRECT-WRITE TECHNIQUE; ELECTRON-DRIVEN; FUTURE PROSPECTS; RESOLUTION CAPABILITY; SCANNING ELECTRON BEAM; SEMICONDUCTING MATERIALS;

EID: 84878693008     PISSN: 13697021     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mattod.2013.04.007     Document Type: Review
Times cited : (17)

References (70)
  • 19
    • 84878725913 scopus 로고    scopus 로고
    • http://smt.zeiss.com/semiconductor-manufacturing-technology/de-de/ website/photomask-systems-ARCHIV/mask-repair/merit-hr32.html
  • 34
  • 42
  • 65
  • 67
    • 66749177859 scopus 로고    scopus 로고
    • H. Zheng Science 324 2009 1309
    • (2009) Science , vol.324 , pp. 1309
    • Zheng, H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.