Molecule-by-molecule writing using a focused electron beam

ACS Nano

Volumn 6, Issue 11, 2012, Pages 10076-10081

  Van Dorp, Willem F ^a   Zhang, Xiaoyan ^b   Feringa, Ben L ^b   Hansen, Thomas W ^c   Wagner, Jakob B ^c   De Hosson, Jeff Th M ^a  

^a UNIVERSITY OF GRONINGEN   (Netherlands)

^b UNIVERSITY OF GRONINGEN   (Netherlands)

^c TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

Author keywords

focused electron beam induced deposition; in situ electron microscopy; local modification; nanostructuring; single molecule

Indexed keywords

FOCUSED ELECTRON-BEAM-INDUCED DEPOSITIONS; IN-SITU ELECTRON MICROSCOPY; LOCAL MODIFICATION; NANO-STRUCTURING; SINGLE MOLECULE;

ELECTRON BEAMS; ELECTRON MICROSCOPY; GRAPHENE; ORGANOMETALLICS; PHOTOLITHOGRAPHY;

MOLECULES;

GRAPHITE; NANOMATERIAL;

ARTICLE; CHEMISTRY; ELECTRON; MATERIALS TESTING; METHODOLOGY; MOLECULAR IMPRINTING; RADIATION EXPOSURE; ULTRASTRUCTURE;

ELECTRONS; GRAPHITE; MATERIALS TESTING; MOLECULAR IMPRINTING; NANOSTRUCTURES;

EID: 84870475120     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn303793w     Document Type: Article

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