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Volumn 26, Issue 4, 2010, Pages 2825-2830

Au-pva nanocomposite negative resist for one-step three-dimensional e-beam lithography

Author keywords

[No Author keywords available]

Indexed keywords

3D LITHOGRAPHY; AU NANOPARTICLE; AU-PVA NANOCOMPOSITES; CRYSTALLINE NANOPARTICLES; E-BEAM LITHOGRAPHY; ELECTRON-BEAM EXPOSURE; IN-SITU; IRRADIATED AREA; LOCALIZED SURFACE PLASMON RESONANCE; MICRO SPECTROSCOPY; NEGATIVE TONES; SINGLE-STEP;

EID: 77149171455     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la902915n     Document Type: Article
Times cited : (35)

References (34)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.