Highly conducting patterned Pd nanowires by direct-write electron beam lithography

ACS Nano

Volumn 2, Issue 3, 2008, Pages 457-462

  Bhuvana, T ^a   Kulkarni, G U ^a  

^a JAWAHARLAL NEHRU CENTRE FOR ADVANCED SCIENTIFIC RESEARCH   (India)

Author keywords

Electrical conductivity; Electron beam lithography; Interconnects; Metal nanowire; Nanopatterning; Thermolysis

Indexed keywords

BULK VALUES; DIRECT WRITE (DW); ELECTRON RESIST (ER); HIGHLY CONDUCTING; NANO-PATTERNS; NEGATIVE TONES; PD NANOWIRES; POST TREATMENTS; PROPERTY (S); RESIDUAL CARBON;

NANOMATERIAL; PALLADIUM;

ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; ELECTRIC CONDUCTIVITY; ELECTRON; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; RADIATION EXPOSURE; SURFACE PROPERTY; ULTRASTRUCTURE;

CRYSTALLIZATION; ELECTRIC CONDUCTIVITY; ELECTRONS; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; PALLADIUM; PARTICLE SIZE; SURFACE PROPERTIES;

EID: 45149133548     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn700372h     Document Type: Article

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