Semiconductor nanostructures defined with self-organizing polymers

Journal of Applied Physics

Volumn 91, Issue 9, 2002, Pages 6057-6059

  Haupt, M ^a   Miller, S ^a   Ladenburger, A ^a   Sauer, R ^a   Thonke, K ^a   Spatz, J P ^b   Riethmuller S ^b   Moller M ^b   Banhart, F ^c  

^a Abteilung Halbleiterphysik   (Germany)

^b UNIVERSITY OF ULM   (Germany)

^c Zentrale Einrichtung Elektronenmikroskopie   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AFTER-TREATMENT; CRYSTALLINE METALS; DIBLOCK COPOLYMER MICELLES; DRY ETCHING PROCESS; GAAS; HIGH ASPECT RATIO; HYDROGEN PLASMAS; LITHOGRAPHY PROCESS; LOW TEMPERATURE PHOTOLUMINESCENCE SPECTROSCOPIES; METAL CLUSTER; ORGANIC COMPONENTS; QUANTUM STRUCTURE; QUANTUM WELL LAYERS; SELF ORGANIZING; SELF-ASSEMBLING; SEMICONDUCTOR NANOSTRUCTURES; TOLUENE SOLUTION;

ASPECT RATIO; BLOCK COPOLYMERS; CHLORINE; CHLORINE COMPOUNDS; DRY ETCHING; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MICELLES; MONOLAYERS; PHOTOLITHOGRAPHY; PHOTOLUMINESCENCE SPECTROSCOPY; PRECIOUS METALS; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTOR QUANTUM WELLS; TOLUENE;

NANOSTRUCTURES;

EID: 0036573051     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1465117     Document Type: Article

References (17)

1. T. Bestwick, M. Dawson, A. Kean, and G. Duggan, Appl. Phys. Lett. 66, 1382 (1995). apl APPLAB 0003-6951
2. D. Bimberg, M. Grundmann and N. Ledentsov, Quantum Dot Heterostructures (Wiley-VCH, Chichester, 1998).
3. D. Leonard, K. Pond, P. Petroff, Phys. Rev. B 50, 11687 (1994). prb PRBMDO 0163-1829
4. J. H. Ryou, R. D. Dupuis, D. T. Mathes, R. Hull, C. V. Reddy, and V. Narayanamurti, Appl. Phys. Lett. 78, 3526 (2001). apl APPLAB 0003-6951
5. M. Haupt, S. Miller, K. Bitzer, K. Thonke, R. Sauer, J. P. Spatz, S. Mössmer, C. Hartmann, and M. Möller, Phys. Status Solidi B 224, 867 (2001). psb PSSBBD 0370-1972
6. J. Spatz, T. Herzog, S. Mößmer, P. Ziemann, and M. Möller, Adv. Mater. 11, 149 (1999). amt ADVMEW 0935-9648
7. R. Li, P. Dapkus, M. Thompson, W. Jeong, C. Harrison, P. Chaikin, R. Register, and D. Adamson, Appl. Phys. Lett. 76, 1689 (2000). apl APPLAB 0003-6951
8. P. Manski, C. Harrison, P. Chaikin, R. Register, and N. Yao, Appl. Phys. Lett. 68, 2586 (1996). apl APPLAB 0003-6951
9. C. Harrison, M. Park, P. Chaikin, R. Register, and D. Adamson, ACS Symp. Ser. 706, 2 (1997). asq ACSMC8 0097-6156
10. J. Spatz, T. Herzog, S. Mößmer, P. Ziemann, and M. Möller, ACS Symp. Ser. 706, 12 (1997). asq ACSMC8 0097-6156
11. J. Spatz, M. Möller, and P. Ziemann, Phys. Bl. 55, 49 (1999). pbl PHBLAG 0031-9279
12. P. Lewis, H. Ahmed, and T. Sato, J. Vac. Sci. Technol. B 16, 2938 (1998). jvb JVTBD9 0734-211X
13. T. Sato, D. Hasko, and H. Ahmed, J. Vac. Sci. Technol. B 15, 45 (1997). jvb JVTBD9 0734-211X
14. J. P. Spatz, S. Mößmer, M. Möller, T. Herzog, H. G. Boyen, P. Ziemann, and B. Kabius, Langmuir 16, 407 (2000). lan LANGD5 0743-7463
15. E. Clausen, H. Craighead, J. Worlock, J. Harbison, L. Schiavone, L. Florez, and B. Van der Gaag, Appl. Phys. Lett. 55, 1427 (1989). apl APPLAB 0003-6951
16. T. Borzenko, Y. Koval, L. Kulik, and A. Larionov, Appl. Phys. Lett. 70, 2297 (1997). apl APPLAB 0003-6951
17. P. R. Schwoebel, and I. Brodie, J. Vac. Sci. Technol. B 13, 1391 (1995). jvb JVTBD9 0734-211X