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Volumn 23, Issue 2, 2013, Pages 173-183

Using directed self assembly of block copolymer nanostructures to modulate nanoscale surface roughness: Towards a novel lithographic process

Author keywords

block copolymers; colloids; lithography; self assembly; surface modification

Indexed keywords

DIRECTED SELF-ASSEMBLY; LITHOGRAPHIC METHODS; LITHOGRAPHIC PATTERNS; LITHOGRAPHIC PROCESS; NANO-SCALE ROUGHNESS; NANO-SCALE SURFACE ROUGHNESS; NANOMETER-SCALE ROUGHNESS; NEGATIVELY CHARGED SURFACES; POLYMERSOMES; POSITIVELY CHARGED; SIGNIFICANT IMPACTS;

EID: 84869025792     PISSN: 1616301X     EISSN: 16163028     Source Type: Journal    
DOI: 10.1002/adfm.201200564     Document Type: Article
Times cited : (23)

References (76)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.