System-level line-edge roughness limits in extreme ultraviolet lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 4, 2008, Pages 1289-1293

  Naulleau, Patrick P ^a   Niakoula, Dimitra ^a   Zhang, Guojing ^b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL DIMENSIONS; EXTREME ULTRA-VIOLET; LINE-EDGE ROUGHNESS; LINE-WIDTH ROUGHNESS; LOW BOUND; LOWER BOUNDS; MULTI LAYERING; PROJECTION OPTICS; SYSTEM LEVELS; TESTING RESULTS;

CONTROL THEORY; EXTREME ULTRAVIOLET LITHOGRAPHY; LITHOGRAPHY;

ROUGHNESS MEASUREMENT;

EID: 49749106687     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2932100     Document Type: Article

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