Non-lift-off block copolymer lithography of 25 nm magnetic nanodot arrays

ACS Applied Materials and Interfaces

Volumn 3, Issue 9, 2011, Pages 3472-3481

  Baruth, A ^a   Rodwogin, Marc D ^a   Shankar, A ^a   Erickson, M J ^a   Hillmyer, Marc A ^a   Leighton, C ^a  

^a University of Minnesota   (United States)

Author keywords

block copolymer; lithography; magnetic; nanodot array; NiFe; PLA

Indexed keywords

BLOCK COPOLYMER FILMS; BLOCK COPOLYMER LITHOGRAPHY; BLOCK COPOLYMER TEMPLATES; ELECTRICAL MEASUREMENT; ETCH DAMAGE; ETCH PROCESS; ETCH RATES; FEATURE SIZES; ION BEAM MILLING; LARGE AREA ARRAYS; MAGNETIC; MAGNETIC METALS; MAGNETIC NANODOTS; METAL SURFACES; NANO-DOT ARRAYS; NANODOTS; NANOLITHOGRAPHIC TECHNIQUES; NANOSTRUCTURE ARRAYS; NIFE; PATTERN FORMATION; PATTERN TRANSFERS; PATTERNED MATERIALS; PLA; SELF-ASSEMBLED;

LITHOGRAPHY; METALS; NANOSTRUCTURED MATERIALS; POLYSTYRENES;

BLOCK COPOLYMERS;

IRON; NANOPARTICLE; NICKEL; POLYESTER; POLYLACTIDE; POLYMER; POLYSTYRENE DERIVATIVE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; MAGNETISM; PARTICLE SIZE;

IRON; MAGNETICS; MICROSCOPY, ATOMIC FORCE; NANOPARTICLES; NICKEL; PARTICLE SIZE; POLYESTERS; POLYMERS; POLYSTYRENES;

EID: 84856492448     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am200693x     Document Type: Article

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