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Volumn 112, Issue 1, 2012, Pages

Synergistic etch rates during low-energetic plasma etching of hydrogenated amorphous carbon

Author keywords

[No Author keywords available]

Indexed keywords

ARGON ION; ATOMIC HYDROGEN; CHEMICAL SPUTTERING; ETCH MECHANISM; ETCH RATES; HIGH FLUX; HYDROGENATED AMORPHOUS CARBON; ION FLUXES; SYNERGISTIC EFFECT;

EID: 84864135008     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4730924     Document Type: Article
Times cited : (19)

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