Effect of substrate conditions on the plasma beam deposition of amorphous hydrogenated carbon

Journal of Applied Physics

Volumn 82, Issue 5, 1997, Pages 2643-2654

  Gielen, J W A M ^a   Kessels, W M M ^a   Van De Sanden, M C M ^a   Schram, D C ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001550788     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366080     Document Type: Article

References (38)

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