Ultraviolet irradiation on hydrogenated amorphous carbon films deposited by atmospheric dielectric barrier discharge

Journal of the Electrochemical Society

Volumn 153, Issue 5, 2006, Pages

  Kugimiya, Toshihiro ^a   Kannaka, Masato ^a   Yokomizo, Mitsutoshi ^b   Nakaue, Akimitsu ^b   Takamatsu, Hiroyuki ^a  

^a KOBE STEEL LTD   (Japan)

^b KOBELCO RESEARCH INSTITUTE INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; CRYSTAL ATOMIC STRUCTURE; DRY ETCHING; IRRADIATION; ULTRAVIOLET RADIATION;

DIELECTRIC BARRIER DISCHARGE-CHEMICAL VAPOR DEPOSITION (DBD-CVD); HYDROGENATED AMORPHOUS CARBON FILM; SURFACE ATOMIC STRUCTURES; ZETA POTENTIAL MEASUREMENTS;

AMORPHOUS FILMS;

EID: 33645693122     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2178658     Document Type: Article

References (29)

1. A. Manz, N. Graer, and H. M. Wildmer, Sens. Actuators B, B1, 244 (1990).
2. A. T. Woolley, K. Q. Lao, A. N. Glazer, and R. A. Mathies, Anal. Chem., 70, 684 (1998).
3. R. M. McCormick, R. J. Nelson, M. G. Alonso-Amigo, D. J. Benvegnu, and H. H. Hooper, Anal. Chem., 69, 2626 (1997).
4. J. S. Rossier, A. Schwarz, F. Reymond, R. Ferrigno, F. Bianchi, and H. H. Girault, Electrophoresis, 20, 727 (1999).
5. N. H. Chiem and D. J. Harrison, Electrophoresis, 19, 3040 (1998).
6. A. Oki, S. Adachi, Y. Takamura, K. Ishihara, H. Ogawa, Y. Ito, T. Ichiki, and Y. Horiike, Electrophoresis, 22, 341 (2001).
7. M. Tokeshi, M. Uchida, A. Hibara, T. Sawada, and T. Kitamori, Anal. Chem., 73, 2112 (2001).
8. K. Ishihara, H. Oshida, T. Ueda, Y. Endo, A. Watanabe, and N. Nakabayashi, J. Biomed. Mater. Res., 26, 1543 (1992).
9. M. Segers and S. K. Dhali, J. Electrochem. Soc., 138, 2741 (1991).
10. S. P. Bugaev, A. D. Korotaev, K. V. Oskomov, and N. S. Sochugov, Surf. Coat. Technol., 96, 123 (1997).
11. D. Liu, S. Yu, T. Ma, S. Z. Song, and X. Yang, Jpn. J. Appl. Phys., Part 1, 39, 3359 (2000).
12. Y. Mori, K. Yoshii, and H. Kakiuchi, Rev. Sci. Instrum., 71, 3173 (2000).
13. Y. Catherine and P. Couderc, Thin Solid Films, 144, 265 (1986).
14. M. Rubin, C. B. Hopper, and N-H. Cho, J. Mater. Res., 5, 2538 (1990).
15. K. Kobashi, K. Nishimura, Y. Kawate, and T. Horiuchi, Phys. Rev. B, 38, 4067 (1988).
16. M. P. Nadler, T. M. Donovan, and A. K. Green, Thin Solid Films, 116, 241 (1984).
17. P. Couderc and Y. Catherine, Thin Solid Films, 146, 93 (1987).
18. J. W. Zou, K. Schmidt, K. Reichelt, and B. Dischler, J. Appl. Phys., 67, 487 (1990).
19. M. Murahara and K. Toyoda, J. Adhes. Sci. Technol., 9, 1601 (1995).
20. T. Okamoto, K. Hatao, T. Shimizu, and M. Murahara, Mater. Res. Soc. Symp. Proc., B12, 4102 (1995).
21. T. Ueda, K. Ishihara, and N. Nakabayashi, J. Biomed. Mater. Res., 29, 381 (1995).
22. T. Xu, R. Fu, and L. Yan, J. Colloid Interface Sci., 262, 342 (2003).
23. H. Adachi, M. Tsukada, and C. Satoko, J. Phys. Soc. Jpn., 45, 875 (1987).
24. D. Liu, T. Ma, S. Yu, Y. Xu, and X. Yang, J. Phys. D, 34, 1651 (2001).
25. J. C. Angus and F. Jansen, J. Vac. Sci. Technol. A, A6, 1778 (1988).
26. W. Jacob and W. Moller, Appl. Phys. Lett., 63, 1771 (1993).
27. M. A. Tamor and C. H. Wu, J. Appl. Phys., 62, 1007 (1989).
28. B. B. Pate, Surf. Sci., 165, 83 (1986).
29. J. Tauc, Amorphous and Liquid Semiconductors, J. Tauc, Editor, Chap., p. 159, Plenum Press, New York (1974).