Effects of the growth conditions on the roughness of amorphous hydrogenated carbon films deposited by plasma enhanced chemical vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 6, 2006, Pages 2212-2216

  Capote, G ^a,b   Prioli, R ^a   Freire Jr , F L ^a  

^a PONTIFICAL CATHOLIC UNIVERSITY OF RIO DE JANEIRO   (Brazil)

^b INSTITUTO NACIONAL DE PESQUISAS ESPACIAIS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; FILM GROWTH; HYDROGENATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SURFACE ROUGHNESS;

SELF-BIAS VOLTAGE; SURFACE DIFFUSION PROCESSES; THERMAL SPIKES;

AMORPHOUS FILMS;

EID: 33750945139     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2362723     Document Type: Article

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