Surface rough of diamond-like carbon films prepared using various techniques

Surface and Coatings Technology

Volumn 138, Issue 1, 2001, Pages 23-32

  Peng, X L ^a   Barber, Z H ^a   Clyne, T W ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

Diamond ike carbon; Subplantation; Surface diffusion; Surface roughness

Indexed keywords

DIFFUSION; GRAPHITE; ION BEAMS; MAGNETRON SPUTTERING; SURFACE ROUGHNESS;

CATHODIC ARCS;

DIAMOND LIKE CARBON FILMS;

DIAMOND-LIKE CARBON; DIAMOND-LIKE COATING; SURFACE ROUGHNESS;

EID: 0035795087     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)01139-7     Document Type: Article

References (18)

1. Observation of hydrogenated amorphous carbon films by atomic force microscopy
2. The influence of substrate and film thickness on the morphology and diamond bond formation during the growth of amorphous diamond-like carbon (DLC) films
3. Observation of the initial stages of growth of hydrogenated amorphous carbon films by scanning tunneling microscopy
4. Scanning tunneling microscopy of diamond-like nanocomposite films
5. Electron emission characteristics of diamond like carbon films deposited by laser ablation technique
6. Thin film characterization of diamond-like carbon films prepared by RF plasma chemical vapour deposition
7. Deposition of ultra-thin diamond-like carbon protective coating on magnetic disks by electron cyclotron resonance plasma technique
8. Roughness and deposition mechanism of DLC films
9. Effect of deposition temperature on the properties of hydrogenated tetrahedral amorphous carbon
10. Deposition of hydrogenated diamond-like carbon films under the impact of energetic hydrocarbon ions
11. Thermal instability of the microstructure and surface mechanical properties of hydrogenated amorphous carbon films
12. Planarisation of substrate surface by means of ultrathin diamond-like carbon film
13. Mechanism of surface smoothing of diamond by a hydrogen plasma
14. Mechanical stability of DLC films on metallic substrates. Part I - Film structure and residual stress levels
15. Carbon thin films
16. Development of preferred orientation polycrystalline AIN thin films deposited by RF sputtering system at low temperature