Chemical erosion of amorphous hydrogenated boron films

Applied Physics Letters

Volumn 71, Issue 10, 1997, Pages 1326-1328

  Annen, A ^a   Jacob, W ^a  

^a MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000720888     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.119885     Document Type: Article

References (18)

1. J. Winter, Plasma Phys. Controlled Fusion 38, 1503 (1996).
2. A. Annen, A. von Keudell, and W. Jacob, J. Nucl. Mater. 231, 151 (1996).
3. E. Vietzke and V. Philipps, Fusion Technol. 15, 108 (1989).
4. A. von Keudell and W. Jacob, J. Appl. Phys. 79, 1092 (1996).
5. A. Annen, R. Beckmann, and W. Jacob, J. Non-Cryst. Solids 209, 240 (1997).
6. W. Fukarek and A. von Keudell, Rev. Sci. Instrum. 66, 3545 (1995).
7. A. Annen, M. Saß, R. Beckmann, and W. Jacob, Thin Solid Films (in press).
8. Y. Catherine, Mater. Sci. Forum 52&53, 175 (1989).
9. von Keudell, A. Annen, and V. Dose, Thin Solid Films (to be published).
10. C. Garcia-Rosales, J. Nucl. Mater. 211, 202 (1994).
11. W. Eckstein, C. Garcia-Rosales, J. Roth, and W. Ottenberger, Sputtering data, Technical Report No. IPP 9/82, Max-Planck-Institut für Plasmaphysik, Germany, 1993.
12. C. Garcia-Rosales and J. Roth. J. Nucl. Mater. 196-198, 573 (1992).
13. M. Wittmann and J. Küppers, J. Nucl. Mater. 227, 186 (1996).
14. A. A. Haasz, J. W. Davis, O. Auciello, P. C. Stangeby, E. Vietzke, K. Flaskamp, and V. Philipps, J. Nucl. Mater. 145-147, 412 (1987).
15. J. W. Davis, A. A. Haasz, and P. C. Stangeby, J. Nucl. Mater. 155-157, 234 (1988).
16. J. W. Davis and A. A. Haasz, J. Nucl. Mater. 195, 166 (1992).
17. A. Schenk, B. Winter, C. Lutterloh, J. Biener, U. A. Schubert, and J. Küppers, J. Nucl. Mater. 220-222, 767 (1995).
18. J. Winter, H. G. Esser, L. Konen, V. Philipps, H. Reimer, J. v. Seggern, J. Schlüter, E. Vietzke, F. Waelbroeck, P. Wienhold, T. Banno, D. Ringer, and V. Veprek, J. Nucl. Mater. 162-164, 713 (1989).