Physical and chemical properties of amorphous hydrogenated carbon films deposited by PECVD in a low self-bias range

Journal of Non-Crystalline Solids

Volumn 351, Issue 10-11, 2005, Pages 877-884

  Maitre N ^a   Camelio, S ^a   Barranco, A ^a   Girardeau, Th ^a   Breelle, E ^b  

^a UMR6630   (France)

^b Laboratoire de Physique Corpusculaire et Cosmologie   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; CONTACT ANGLE; ELASTIC MODULI; ELLIPSOMETRY; HARDNESS; HYDROGENATION; INTERFACIAL ENERGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; STRESSES;

AMORPHOUS HYDROGENATED CARBON FILMS; CARBON BONDS; ELASTIC RECOIL DETECTION ANALYSIS; LOW SELF BIAS RANGE;

AMORPHOUS FILMS;

EID: 17044382183     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2005.01.058     Document Type: Article

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