Formation of cationic silicon clusters in a remote silane plasma and their contribution to hydrogenated amorphous silicon film growth

Journal of Applied Physics

Volumn 86, Issue 7, 1999, Pages 4029-4039

  Kessels, W M M ^a   Leewis, C M ^a   Van De Sanden, M C M ^a   Schram, D C ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000232468     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371324     Document Type: Article

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