The expanding thermal arc plasma: The low-flow regime

Plasma Sources Science and Technology

Volumn 7, Issue 1, 1998, Pages 28-35

  Van De Sanden, M C M ^a   Tobin, J A ^b  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b NOVELLUS SYSTEMS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ELECTRIC ARCS; PLASMA DENSITY; PLASMA FLOW; PLASMA PROBES; PLASMA SPRAYING;

LANGMUIR PROBE; PLASMA EXPANSION; PLASMA RADIAL PROFILES;

PLASMA SOURCES;

EID: 0032000392     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/7/1/005     Document Type: Article

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