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Volumn 520, Issue 1, 2011, Pages 245-250

The influence of CH4 addition on composition, structure and optical characteristics of SiCN thin films deposited in a CH4/N 2/Ar/hexamethyldisilazane microwave plasma

(7) Bulou, Simon a Le Brizoual, Laurent b Miska, Patrice a De Poucques, Ludovic a Hugon, Robert a Belmahi, Mohammed a Bougdira, Jamal a

a INSTITUT JEAN LAMOUR (France)

b INSTITUT DES MATÉRIAUX JEAN ROUXEL (France)

Author keywords

Fourier transform infrared spectroscopy; Hexamethyldisilazane; Microwave plasma assisted chemical vapor deposition; Optical properties; Silicon carbonitride; X ray photoelectron spectroscopy

Indexed keywords

BAND GAP NARROWING; FILM OXIDATION RESISTANCE; GASEOUS MIXTURE; HEXAMETHYLDISILAZANE; MICROWAVE PLASMA; MICROWAVE PLASMA-ASSISTED CHEMICAL VAPOR DEPOSITION; OPTICAL CHARACTERISTICS; RATE INCREASE; SILICON CARBONITRIDE; THIN FILM DENSITIES;

AMORPHOUS SILICON; CARBON NITRIDE; CHEMICAL VAPOR DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN BONDS; LIGHT REFRACTION; MICROWAVES; OPTICAL CONSTANTS; PHOTOELECTRON SPECTROSCOPY; PLASMAS; RATE CONSTANTS; REFRACTIVE INDEX; REFRACTOMETERS; SILICON NITRIDE; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 80054019459 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.07.054 Document Type: Article

Times cited : (35)

References (54)

1
- 19244386346
- J. Vlcek, M. Kormunda, J. Cizek, Z. Soukup, V. Perina, and J. Zemek Diamond Relat. Mater. 12 2003 1287
- (2003) Diamond Relat. Mater. , vol.12 , pp. 1287
- Vlcek, J.¹ Kormunda, M.² Cizek, J.³ Soukup, Z.⁴ Perina, V.⁵ Zemek, J.⁶

2
- 0035448843
- H.L. Chang, and C.T. Kuo Diamond Relat. Mater. 10 2001 1910
- (2001) Diamond Relat. Mater. , vol.10 , pp. 1910
- Chang, H.L.¹ Kuo, C.T.²

3
- 1342281316
- P. Jedrzejowski, J. Cizek, A. Amassian, J.E. Klemberg-Sapieha, J. Vlcek, and L. Martinu Thin Solid Films 447-448 2004 201
- (2004) Thin Solid Films , vol.447-448 , pp. 201
- Jedrzejowski, P.¹ Cizek, J.² Amassian, A.³ Klemberg-Sapieha, J.E.⁴ Vlcek, J.⁵ Martinu, L.⁶

4
- 0029637640
- R. Riedel, H.J. Kleebe, H. Schönfelder, and F. Aldinger Nature 374 1995 526
- (1995) Nature , vol.374 , pp. 526
- Riedel, R.¹ Kleebe, H.J.² Schönfelder, H.³ Aldinger, F.⁴

5
- 70349419705
- F. Schwarz, C. Hammer, G. Thorwarth, M. Kuhn, and B. Stritzker Plasma Process. Polym. 4 2007 S254
- (2007) Plasma Process. Polym. , vol.4 , pp. 254
- Schwarz, F.¹ Hammer, C.² Thorwarth, G.³ Kuhn, M.⁴ Stritzker, B.⁵

6
- 33748676839
- R. Kolb, C. Fasel, V. Liebau-Kunzmann, and R. Riedel J. Eur. Ceram. Soc. 26 2006 3903
- (2006) J. Eur. Ceram. Soc. , vol.26 , pp. 3903
- Kolb, R.¹ Fasel, C.² Liebau-Kunzmann, V.³ Riedel, R.⁴

7
- 44249112620
- C.H. Chen, M.R. Yang, and S.K. Wu Surf. Coat. Technol. 202 2008 2709
- (2008) Surf. Coat. Technol. , vol.202 , pp. 2709
- Chen, C.H.¹ Yang, M.R.² Wu, S.K.³

8
- 0035501094
- H.L. Chang, and C.T. Kuo Mater. Chem. Phys. 72 2001 236
- (2001) Mater. Chem. Phys. , vol.72 , pp. 236
- Chang, H.L.¹ Kuo, C.T.²

9
- 0033313358
- L.C. Chen, K.H. Chen, S.L. Wei, P.D. Kichambare, J.J. Wu, T.R. Lu, and C.T. Kuo Thin Solid Films 355-356 1999 112
- (1999) Thin Solid Films , vol.355-356 , pp. 112
- Chen, L.C.¹ Chen, K.H.² Wei, S.L.³ Kichambare, P.D.⁴ Wu, J.J.⁵ Lu, T.R.⁶ Kuo, C.T.⁷

10
- 0342620671
- L.C. Chen, C.K. Chen, S.L. Wei, D.M. Bhusari, K.H. Chen, Y.F. Chen, Y.C. Jong, and Y.S. Huang Appl. Phys. Lett. 72 19 1998 2463
- (1998) Appl. Phys. Lett. , vol.72 , Issue.19 , pp. 2463
- Chen, L.C.¹ Chen, C.K.² Wei, S.L.³ Bhusari, D.M.⁴ Chen, K.H.⁵ Chen, Y.F.⁶ Jong, Y.C.⁷ Huang, Y.S.⁸

11
- 18444391842
- C.W. Chen, C.C. Huang, Y.Y. LL.C. Chen, K.H. Chen, and W.F. Su Diamond Relat. Mater. 14 2005 1010
- (2005) Diamond Relat. Mater. , vol.14 , pp. 1010
- Chen, C.W.¹ Huang, C.C.² Lin, Y.Y.³ Chen, L.C.⁴ Chen, K.H.⁵ Su, W.F.⁶

12
- 21844439448
- I.V. Afanasyev-Charkand M. Nastasi Surf. Coat. Technol. 199 2005 38
- (2005) Surf. Coat. Technol. , vol.199 , pp. 38
- Afanasyev-Charkin, I.V.¹ Nastasi, M.²

13
- 32944463013
- C.W. Chen, C.C. Huang, Y.Y. LW.F. Su, L.C. Chen, and K.H. Chen Appl. Phys. Lett. 88 2006 073515
- (2006) Appl. Phys. Lett. , vol.88 , pp. 073515
- Chen, C.W.¹ Huang, C.C.² Lin, Y.Y.³ Su, W.F.⁴ Chen, L.C.⁵ Chen, K.H.⁶

14
- 47649128856
- T.H. Chou, Y.K. Fang, Y.T. Chiang, C.I. Land C.Y. Yang Sens. Actuators, A 147 2008 60
- (2008) Sens. Actuators, A , vol.147 , pp. 60
- Chou, T.H.¹ Fang, Y.K.² Chiang, Y.T.³ Lin, C.I.⁴ Yang, C.Y.⁵

15
- 0037829766
- R. Reyes, C. Legnani, P.M. Ribeiro Pinto, M. Cremona, P.J.G. de Araujo, and C.A. Achete Appl. Phys. Lett. 82 2003 4017
- (2003) Appl. Phys. Lett. , vol.82 , pp. 4017
- Reyes, R.¹ Legnani, C.² Ribeiro Pinto, P.M.³ Cremona, M.⁴ De Araujo, P.J.G.⁵ Achete, C.A.⁶

16
- 1842479748
- W.R. Chang, Y.K. Fang, S.F. Ting, S.F. Chen, C.Y. LS.B. Hwang, and C.N. Chang J. Electron. Mater. 33 3 2004 181
- (2004) J. Electron. Mater. , vol.33 , Issue.3 , pp. 181
- Chang, W.R.¹ Fang, Y.K.² Ting, S.F.³ Chen, S.F.⁴ Lin, C.Y.⁵ Hwang, S.B.⁶ Chang, C.N.⁷

17
- 1442360277
- M. Vetter, I. MartA. Orpella, J. Puigdollers, C. Voz, and R. Alcubilla Thin Solid Films 451-452 2004 340
- (2004) Thin Solid Films , vol.451-452 , pp. 340
- Vetter, M.¹ Martin, I.² Orpella, A.³ Puigdollers, J.⁴ Voz, C.⁵ Alcubilla, R.⁶

18
- 36749058903
- A. Limmanee, M. Otsubo, T. Sugiura, T. Sato, S. Miyajima, A. Yamada, and M. Konagai Thin Solid Films 516 2008 652
- (2008) Thin Solid Films , vol.516 , pp. 652
- Limmanee, A.¹ Otsubo, M.² Sugiura, T.³ Sato, T.⁴ Miyajima, S.⁵ Yamada, A.⁶ Konagai, M.⁷

19
- 33748166991
- E. Vassallo, A. Cremona, F. Ghezzi, F. Dellera, L. Laguardia, G. Ambrosone, and U. Coscia Appl. Surf. Sci. 252 2006 7993
- (2006) Appl. Surf. Sci. , vol.252 , pp. 7993
- Vassallo, E.¹ Cremona, A.² Ghezzi, F.³ Dellera, F.⁴ Laguardia, L.⁵ Ambrosone, G.⁶ Coscia, U.⁷

20
- 65449174981
- O. Baake, N.I. Fainer, P. Hoffmann, M.L. Kosinova, Yu.M. Rumyantsev, V.A. Trunova, A. KleW. Ensinger, B. Pollakowski, B. Beckhoff, and G. Ulm Nucl. Instrum. Methods Phys. Res., Sect. A 603 2009 174
- (2009) Nucl. Instrum. Methods Phys. Res., Sect. A , vol.603 , pp. 174
- Baake, O.¹ Fainer, N.I.² Hoffmann, P.³ Kosinova, M.L.⁴ Rumyantsev, Yu.M.⁵ Trunova, V.A.⁶ Klein, A.⁷ Ensinger, W.⁸ Pollakowski, B.⁹ Beckhoff, B.¹⁰ Ulm, G.¹¹

21
- 77954901686
- S. Bulou, L. Le Brizoual, R. Hugon, L. de Poucques, M. Belmahi, H.N. Migeon, and J. Bougdira Plasma Process. Polym. 6 2009 S576
- (2009) Plasma Process. Polym. , vol.6 , pp. 576
- Bulou, S.¹ Le Brizoual, L.² Hugon, R.³ De Poucques, L.⁴ Belmahi, M.⁵ Migeon, H.N.⁶ Bougdira, J.⁷

22
- 84908413312
- S. Bulou, L. Le Brizoual, P. Miska, L. de Poucques, R. Hugon, and M. Belmahi IOP Conf. Ser.: Mater. Sci. Eng. 12 2010 012002
- (2010) IOP Conf. Ser.: Mater. Sci. Eng. , vol.12 , pp. 012002
- Bulou, S.¹ Le Brizoual, L.² Miska, P.³ De Poucques, L.⁴ Hugon, R.⁵ Belmahi, M.⁶

23
- 55249086470
- P. Kouakou, M. Belmahi, V. Brien, V. Hody, H.N. Migeon, and J. Bougdira Surf. Coat. Technol. 203 2008 277
- (2008) Surf. Coat. Technol. , vol.203 , pp. 277
- Kouakou, P.¹ Belmahi, M.² Brien, V.³ Hody, V.⁴ Migeon, H.N.⁵ Bougdira, J.⁶

24
- 0034292081
- D.H. Kuo, and D.G. Yang Thin Solid Films 374 2000 92
- (2000) Thin Solid Films , vol.374 , pp. 92
- Kuo, D.H.¹ Yang, D.G.²

25
- 0000164492
- B.A. Movchan, and A.V. Demchishin Phys. Met. Metallogr. 28 1969 83
- (1969) Phys. Met. Metallogr. , vol.28 , pp. 83
- Movchan, B.A.¹ Demchishin, A.V.²

26
- 0017719586
- J.A. Thornton Annu. Rev. Mater. Sci. 7 1977 239
- (1977) Annu. Rev. Mater. Sci. , vol.7 , pp. 239
- Thornton, J.A.¹

27
- 0036902481
- B. Dumay, E. Finot, M. Theobald, O. Legaie, J. Durand, P. Baclet, and J.P. Goudonnet J. Appl. Phys. 92 2002 6572
- (2002) J. Appl. Phys. , vol.92 , pp. 6572
- Dumay, B.¹ Finot, E.² Theobald, M.³ Legaie, O.⁴ Durand, J.⁵ Baclet, P.⁶ Goudonnet, J.P.⁷

28
- 0037186085
- E. Finot, S. Roualdes, M. Kirchner, V. Rouessac, R. Berjoan, J. Durand, J.P. Goudonnet, and L. Cot Appl. Surf. Sci. 187 2002 326
- (2002) Appl. Surf. Sci. , vol.187 , pp. 326
- Finot, E.¹ Roualdes, S.² Kirchner, M.³ Rouessac, V.⁴ Berjoan, R.⁵ Durand, J.⁶ Goudonnet, J.P.⁷ Cot, L.⁸

29
- 33748604315
- B. Borer, A. Sonnenfeld, and Ph. Rudolf von Rohr Surf. Coat. Technol. 201 2006 1757
- (2006) Surf. Coat. Technol. , vol.201 , pp. 1757
- Borer, B.¹ Sonnenfeld, A.² Von Rohr, R.Ph.³

30
- 0037967607
- F.J. Gomez, P. Prieto, E. Elizalde, and J. Piqueras Appl. Phys. Lett. 69 6 1996 773
- (1996) Appl. Phys. Lett. , vol.69 , Issue.6 , pp. 773
- Gomez, F.J.¹ Prieto, P.² Elizalde, E.³ Piqueras, J.⁴

31
- 38849117731
- N.I. Fainer, M.L. Kosinova, Yu.M. Rumyantsev, E.A. Maximovskii, and F.A. Kuznetsov J. Phys. Chem. Solids 69 2008 661
- (2008) J. Phys. Chem. Solids , vol.69 , pp. 661
- Fainer, N.I.¹ Kosinova, M.L.² Rumyantsev, Yu.M.³ Maximovskii, E.A.⁴ Kuznetsov, F.A.⁵

32
- 18444418316
- C.W. Chen, C.C. Huang, Y.Y. LL.C. Chen, and K.H. Chen Diamond Relat. Mater. 14 2005 1126
- (2005) Diamond Relat. Mater. , vol.14 , pp. 1126
- Chen, C.W.¹ Huang, C.C.² Lin, Y.Y.³ Chen, L.C.⁴ Chen, K.H.⁵

33
- 0000513694
- G.N. Parsons, J.H. Souk, and J. Batey J. Appl. Phys. 70 1991 1553
- (1991) J. Appl. Phys. , vol.70 , pp. 1553
- Parsons, G.N.¹ Souk, J.H.² Batey, J.³

34
- 0001631508
- B.R. Zhang, Z. Yu, G.J. Collins, T. Hwang, and W.H. Ritchie J. Vac. Sci. Technol. A 7 1989 176
- (1989) J. Vac. Sci. Technol. A , vol.7 , pp. 176
- Zhang, B.R.¹ Yu, Z.² Collins, G.J.³ Hwang, T.⁴ Ritchie, W.H.⁵

35
- 29844457849
- W.S. Liao, C.H. Land S.C. Lee Appl. Phys. Lett. 65 17 1994 2229
- (1994) Appl. Phys. Lett. , vol.65 , Issue.17 , pp. 2229
- Liao, W.S.¹ Lin, C.H.² Lee, S.C.³

36
- 0344339153
- M.T. Kim Thin Solid Films 347 1999 99
- (1999) Thin Solid Films , vol.347 , pp. 99
- Kim, M.T.¹

37
- 2942622300
- Y.H. Wang, M.R. Moitreyee, R. Kumar, L. Shen, K.Y. Zeng, J.W. Chai, and J.S. Pan Thin Solid Films 460 2004 211
- (2004) Thin Solid Films , vol.460 , pp. 211
- Wang, Y.H.¹ Moitreyee, M.R.² Kumar, R.³ Shen, L.⁴ Zeng, K.Y.⁵ Chai, J.W.⁶ Pan, J.S.⁷

38
- 0034506258
- N. Banerji, J. Serra, S. Chiussi, B. Leon, and M. Perez-Amor Appl. Surf. Sci. 268 2000 52
- (2000) Appl. Surf. Sci. , vol.268 , pp. 52
- Banerji, N.¹ Serra, J.² Chiussi, S.³ Leon, B.⁴ Perez-Amor, M.⁵

39
- 33748143438
- A. Soum-Glaude, L. Thomas, and E. Tomasella Surf. Coat. Technol. 200 2006 6425
- (2006) Surf. Coat. Technol. , vol.200 , pp. 6425
- Soum-Glaude, A.¹ Thomas, L.² Tomasella, E.³

40
- 0035387351
- L. Thomas, L. Maillé, J.M. Badie, and M. Ducarroir Surf. Coat. Technol. 142-144 2001 314
- (2001) Surf. Coat. Technol. , vol.142-144 , pp. 314
- Thomas, L.¹ Maillé, L.² Badie, J.M.³ Ducarroir, M.⁴

41
- 27644536809
- R. Di Mundo, R. d'Agostino, F. Fracassi, and F. Palumbo Plasma Process. Polym. 2 2005 612
- (2005) Plasma Process. Polym. , vol.2 , pp. 612
- Di Mundo, R.¹ D'Agostino, R.² Fracassi, F.³ Palumbo, F.⁴

42
- 0040524405
- A.M. Wróbel, S. Wickramanayaka, K. Kitamura, Y. Nakanishi, and Y. Hatanaka Chem. Vap. Deposition 6 6 2000 315
- (2000) Chem. Vap. Deposition , vol.6 , Issue.6 , pp. 315
- Wróbel, A.M.¹ Wickramanayaka, S.² Kitamura, K.³ Nakanishi, Y.⁴ Hatanaka, Y.⁵

43
- 0021388469
- M.L. Naiman, C.T. Kirk, R.J. AucoF.L. Terry, P.W. Wyatt, and S.D. Senturia J. Electrochem. Soc. 131 1984 637
- (1984) J. Electrochem. Soc. , vol.131 , pp. 637
- Naiman, M.L.¹ Kirk, C.T.² Aucoin, R.J.³ Terry, F.L.⁴ Wyatt, P.W.⁵ Senturia, S.D.⁶

44
- 0032046367
- N. Banerji, J. Serra, P. Gonzalez, S. Chiussi, E. Parada, B. Leon, and M. Perez-Amor Thin Solid Films 317 1998 214
- (1998) Thin Solid Films , vol.317 , pp. 214
- Banerji, N.¹ Serra, J.² Gonzalez, P.³ Chiussi, S.⁴ Parada, E.⁵ Leon, B.⁶ Perez-Amor, M.⁷

45
- 30344431501
- I. Blaszczyk-Lezak, A.M. Wrobel, T. Aoki, Y. Nakanishi, I. Kucinska, and A. Tracz Thin Solid Films 497 2006 24
- (2006) Thin Solid Films , vol.497 , pp. 24
- Blaszczyk-Lezak, I.¹ Wrobel, A.M.² Aoki, T.³ Nakanishi, Y.⁴ Kucinska, I.⁵ Tracz, A.⁶

46
- 3042545137
- E. Tomasella, L. Thomas, M. Dubois, and C. Meunier Diamond Relat. Mater. 13 2004 1618
- (2004) Diamond Relat. Mater. , vol.13 , pp. 1618
- Tomasella, E.¹ Thomas, L.² Dubois, M.³ Meunier, C.⁴

47
- 75749120590
- H.F.W. Dekkers, Nagendra Babu Srinivasan, and G. Pourtois Appl. Phys. Lett. 96 2010 011902
- (2010) Appl. Phys. Lett. , vol.96 , pp. 011902
- Dekkers, H.F.W.¹ Srinivasan, N.B.² Pourtois, G.³

48
- 0037134134
- L. Da Silva Zambom, R. Domingues Mansano, and R. Furlan Vacuum 65 2002 213
- (2002) Vacuum , vol.65 , pp. 213
- Da Silva Zambom, L.¹ Domingues Mansano, R.² Furlan, R.³

49
- 0020940620
- R. Swanepoel J. Phys. E: Sci. Instrum. 16 1983 1214
- (1983) J. Phys. E: Sci. Instrum. , vol.16 , pp. 1214
- Swanepoel, R.¹

50
- 0014832699
- J. Tauc Mater. Res. Bull. 5 1970 721
- (1970) Mater. Res. Bull. , vol.5 , pp. 721
- Tauc, J.¹

51
- 40549137031
- A.M. Wrobel, and I. Blaszczyk-Lezak Chem. Vap. Depos. 13 2007 601
- (2007) Chem. Vap. Depos. , vol.13 , pp. 601
- Wrobel, A.M.¹ Blaszczyk-Lezak, I.²

52
- 0000737995
- C. Ance, F. de Chelle, J.P. Ferraton, G. Leveque, P. Ordejon, and F. Yndurain Appl. Phys. Lett. 60 1992 1399
- (1992) Appl. Phys. Lett. , vol.60 , pp. 1399
- Ance, C.¹ De Chelle, F.² Ferraton, J.P.³ Leveque, G.⁴ Ordejon, P.⁵ Yndurain, F.⁶

53
- 0042324523
- N.M. Park, S.H. Kim, and G.Y. Sung J. Appl. Phys. 94 2003 2725
- (2003) J. Appl. Phys. , vol.94 , pp. 2725
- Park, N.M.¹ Kim, S.H.² Sung, G.Y.³

54
- 0040524405
- A.M. Wróbel, S. Wickramanayaka, K. Kitamura, Y. Nakanishi, and Y. Hatanaka Chem. Vap. Depos. 6 6 2000 315
- (2000) Chem. Vap. Depos. , vol.6 , Issue.6 , pp. 315
- Wróbel, A.M.¹ Wickramanayaka, S.² Kitamura, K.³ Nakanishi, Y.⁴ Hatanaka, Y.⁵

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