Structure-property relationships of amorphous hydrogenated silicon-carbon films produced by atomic hydrogen-induced CVD from a single-source precursor

Chemical Vapor Deposition

Volumn 6, Issue 6, 2000, Pages 315-322

  Wróbel, Aleksander M ^a   Wickramanayaka, Sunil ^b   Kitamura, Ken ^c   Nakanishi, Yoichiro ^c   Hatanaka, Yoshinori ^c  

^a CENTRE OF MOLECULAR AND MACROMOLECULAR STUDIES   (Poland)

^b Canon ANELVA Technix Corporation   (Japan)

^c SHIZUOKA UNIVERSITY   (Japan)

Author keywords

Atomic hydrogen; Hexamethyldisilane precursor; Hydrogen plasma; Mechanical properties; Optical properties; Silicon carbon film

Indexed keywords

EID: 0040524405     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-3862(200011)6:6<315::AID-CVDE315>3.0.CO;2-7     Document Type: Article

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