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Volumn 201, Issue 3-4, 2006, Pages 1757-1762

Influence of substrate temperature on morphology of SiOx films deposited on particles by PECVD

Author keywords

Circulating fluidized bed; Coating; Nodular defect; Particulate substrate; PECVD; Shadowing effect; Structure zone model

Indexed keywords

CHEMICAL REACTORS; FLUIDIZED BEDS; FRACTURE; MONOMERS; MORPHOLOGY; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; THERMAL EFFECTS; THIN FILMS;

EID: 33748604315     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.03.001     Document Type: Article
Times cited : (29)

References (26)
  • 19
    • 33748622777 scopus 로고    scopus 로고
    • VDI Verlag, Düsseldorf. 3-18-371903-7
    • Karches M. VDI Reihe 3 vol. 719 (2002), VDI Verlag, Düsseldorf. 3-18-371903-7
    • (2002) VDI Reihe 3 , vol.719
    • Karches, M.1
  • 20
    • 0037136086 scopus 로고    scopus 로고
    • L.I., Lai Y.J., et al. Vacuum 66 (2002) 285
    • (2002) Vacuum , vol.66 , pp. 285
    • Lai, Y.J.1
  • 21
    • 0001193734 scopus 로고
    • Chu J.H., and L.I. J. Appl. Phys. 74 7 (1993) 4741
    • (1993) J. Appl. Phys. , vol.74 , Issue.7 , pp. 4741
    • Chu, J.H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.