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Volumn 201, Issue 3-4, 2006, Pages 1757-1762
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Influence of substrate temperature on morphology of SiOx films deposited on particles by PECVD
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Author keywords
Circulating fluidized bed; Coating; Nodular defect; Particulate substrate; PECVD; Shadowing effect; Structure zone model
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Indexed keywords
CHEMICAL REACTORS;
FLUIDIZED BEDS;
FRACTURE;
MONOMERS;
MORPHOLOGY;
NUCLEATION;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SCANNING ELECTRON MICROSCOPY;
THERMAL EFFECTS;
THIN FILMS;
CIRCULATING FLUIDIZED BED;
NODULAR DEFECT;
PARTICULATE SUBSTRATE;
SHADOWING EFFECT;
STRUCTURE ZONE MODEL;
SILICA GEL;
CHEMICAL REACTORS;
FLUIDIZED BEDS;
FRACTURE;
MONOMERS;
MORPHOLOGY;
NUCLEATION;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SCANNING ELECTRON MICROSCOPY;
SILICA GEL;
THERMAL EFFECTS;
THIN FILMS;
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EID: 33748604315
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2006.03.001 Document Type: Article |
Times cited : (29)
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References (26)
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