Crystalline SiCN: A hard material rivals to cubic BN

Thin Solid Films

Volumn 355, Issue , 1999, Pages 112-116

  Chen, L C ^a   Chen, K H ^b   Wei, S L ^a   Kichambare, P D ^a   Wu, J J ^b   Lu, T R ^c   Kuo, C T ^c  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b INSTITUTE OF ATOMIC AND MOLECULAR SCIENCES   (Taiwan)

^c NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON INORGANIC COMPOUNDS; CRYSTAL GROWTH; CRYSTALLINE MATERIALS; CUBIC BORON NITRIDE; ELECTRON CYCLOTRON RESONANCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON COMPOUNDS;

ELECTRON CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR DEPOSITION (CVD); MICROWAVE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (MPECVD);

AMORPHOUS FILMS;

EID: 0033313358     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00490-3     Document Type: Article

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