A novel organosilicon source for low temperature plasma deposition of silicon nitride-like thin films

Plasma Processes and Polymers

Volumn 2, Issue 8, 2005, Pages 612-617

  Di Mundo, Rosa ^a   d'Agostino, Riccardo ^a   Fracassi, Francesco ^a   Palumbo, Fabio ^b  

^a UNIVERSITY OF BARI   (Italy)

^b CNR   (Italy)

Author keywords

FT IR; Inductively coupled; Plasma enhanced chemical vapor deposition (PE CVD); Silicon nitride like; XPS

Indexed keywords

ABSORPTION SPECTROSCOPY; ARGON; CERAMIC COATINGS; COMPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INDUCTIVELY COUPLED PLASMA; LOW TEMPERATURE EFFECTS; MONOMERS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

LOW TEMPERATURE PLASMA DEPOSITION; ORGANOSILICON SOURCE; RADIO FREQUENCY; SILICON NITRIDE THIN FILMS;

SILICON NITRIDE;

EID: 27644536809     PISSN: 16128850     EISSN: None     Source Type: Journal    
DOI: 10.1002/ppap.200500035     Document Type: Article

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