Effect of thermal annealing on the properties of a-SiCN:H films by hot wire chemical vapor deposition using hexamethyldisilazane

Thin Solid Films

Volumn 516, Issue 5, 2008, Pages 652-655

  Limmanee, Amornrat ^a   Otsubo, Michio ^a   Sugiura, Tsutomu ^a   Sato, Takehiko ^b   Miyajima, Shinsuke ^a   Yamada, Akira ^a   Konagai, Makoto ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

Antireflection coating; Hexamethyldisilazane; Hot wire CVD; Passivation layer; SiCN:H film; Silicon solar cells

Indexed keywords

ANNEALING; AROMATIC HYDROCARBONS; CHEMICAL VAPOR DEPOSITION; PASSIVATION; SEMICONDUCTING SILICON COMPOUNDS;

ANTIREFLECTION COATING; HEXAMETHYLDISILAZANE; HOT WIRE CHEMICAL VAPOR DEPOSITION; PASSIVATION LAYERS;

THIN FILMS;

EID: 36749058903     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.217     Document Type: Article

References (9)

1. Vetter M., Martin I., Orpella A., Puigdollers J., Voz C., and Alcubilla R. Thin Solid Films 451-452 (2004) 340
2. Izumi A., and Oda K. Thin Solid Films 501 (2006) 195
3. Otsubo M., Sato T., Miyajima S., Limmanee A., Yamada A., and Konagai M. Proceeding of 15th International Photovoltaic Science and Engineering Conference, Shanghai, China, October 10-15 (2005) 305
4. Limmanee A., Otsubo M., Sato T., Miyajima S., Yamada A., and Konagai M. Proceeding of IEEE 4th World Conference on Photovoltaic Energy Conversion, Hawai, U.S.A, May 7-12 (2006)
5. Ichimura M., Hirano M., Tada A., Arai E., Takamatsu H., and Sumie S. Mater. Sci. Eng. B73 (2000) 230
6. Terman L.M. Solid-State Electron. 5 (1962) 285
7. Nicollian E.H., and Brew J.R. Metal Oxide Semiconductor Physics and Technology (1981), John Wiley & Sons, New York 486
8. Yagi S., Abe K., Yamada A., and Konagai M. Jpn. J. Appl. Phys. 42 (2003) 1499
9. Yamamoto Y., Uraoka Y., and Fuyuki T. Jpn. J. Appl. Phys. 42 (2003) 5135