The Contact Characteristics of SICN Films for Opto-Electrical Devices Applications

Journal of Electronic Materials

Volumn 33, Issue 3, 2004, Pages 181-184

  Chang, Wen Rong ^a   Fang, Yean Kuen ^a   Ting, Shyh Fann ^a   Chen, Shih Fang ^a   Lin, Chun Yu ^a   Hwang, Sheng Beng ^a   Chang, Cheng Nan ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Electroluminescence; Light emitting; Silicon carbon nitride; Ultraviolet

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COATING TECHNIQUES; ELECTROLUMINESCENCE; OHMIC CONTACTS; OPTOELECTRONIC DEVICES; OXIDATION RESISTANCE; PHOTOLUMINESCENCE; SCHOTTKY BARRIER DIODES; SEMICONDUCTING SILICON; SILICON CARBIDE; ULTRAVIOLET RADIATION;

LIGHT EMITTING; SILICON CARBON NITRIDE;

SEMICONDUCTING FILMS;

EID: 1842479748     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-004-0177-8     Document Type: Article

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