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Volumn 142-144, Issue , 2001, Pages 314-320

Microwave plasma chemical vapour deposition of tetramethylsilane: Correlations between optical emission spectroscopy and film characteristics

(4) Thomas, L a Maille L a Badie, J M b Ducarroir, M a

a UNIVERSITÉ DE PERPIGNAN (France)

b CNRS (France)

Author keywords

Hard coatings; Microwave plasma; Optical emission spectroscopty; Tetramethylsilane

Indexed keywords

CHEMICAL REACTORS; EMISSION SPECTROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HARDNESS; MICROWAVES; SILICON COMPOUNDS; VAPOR DEPOSITION; X RAY SPECTROSCOPY;

REACTOR AXIS;

PLASMAS;

SILICON CARBIDE;

EID: 0035387351 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(01)01081-7 Document Type: Article

Times cited : (49)

References (26)

1
- 0003491197
- (1998) Ann. Chim. Sci. Mater , vol.23 , pp. 879
- Boher, C.¹ Ducarroir, M.² Grégoire, T.³ Scordo, S.⁴

2
- 0001473743
- (1991) J. Appl. Phys , vol.69 , pp. 2951
- Rynders, S.W.¹ Sheeline, A.² Bohn, P.W.³

3
- 0041916032
- (1993) J. Phys , vol.4 , Issue.3 , pp. 503
- Smeets, J.¹ Meneve, J.² Jacobs, R.³ Eersels, L.⁴ Dekempeneer, E.⁵

4
- 0039645796
- Dunod Edition
- (1980) Introduction à La Spectroscopie Des Plasmas
- Pecker-Wimel, C.¹

5
- 0003501942
- SFV Edition
- (1995) Reactive Plasmas
- Ricard, A.¹

6
- 0001825554
- (1992) Plasma Source Sci. Technol , vol.1 , pp. 59
- Favia, P.¹ Lamendola, R.² d'Agostino, R.³

7
- 0003568160
- (1998) Ann. Chim. Sci. Mater , vol.23 , pp. 743
- Andrieux, M.¹ Badie, J.M.² Ducarroir, M.³ Thomas, L.⁴

8
- 0003740740
- (Eds.), Chapman and Hall, New York
- (1976) The Identification of Molecular Spectra
- Pearse, R.W.B.¹ Gaydon, A.G.²

9
- 0003687888
- (1984) CVD IX Proceedings , pp. 213
- Nguyen, V.S.¹

10
- 0003527573
- IFI Plenum
- (1968) Table of Spectral Lines of Neutrals and Ionized Atoms
- Striganov, A.R.¹

11
- 0003567430
- (1974) Can. J. Phys , vol.52 , pp. 1938
- Verma, R.D.¹ Nagaraj, S.²

12
- 0001249538
- (1983) Chem. Phys , vol.80 , pp. 351
- Perrin, J.¹ Aarts, J.F.M.²

13
- 36449004638
- (1992) J. Appl. Phys , vol.71 , Issue.9 , pp. 4156
- Meeusen, G.J.¹ Ershov-Pavlov, E.A.²

14
- 84957229421
- (1990) J. Vac. Sci. Technol. A , vol.9 , Issue.3 , pp. 450
- Delplancke, M.P.¹ Powers, J.M.² Vandentop, G.J.³

15
- 0030234848
- (1996) Thin Solid Films , vol.283 , pp. 109
- Kim, D.S.¹ Lee, Y.H.²

16
- 0018482131
- (1979) Thin Solid Films , vol.60 , pp. 193
- Catherine, Y.¹ Turban, G.²

17
- 0026850451
- (1992) Jpn. J. Appl. Phys , vol.31 , Issue.4 A , pp. 379
- Yasui, K.¹ Fujita, A.² Akahane, T.³

18
- 0000120189
- (1996) Mater. Sci. Eng. B , vol.39 , pp. 188
- Liu, Y.J.¹ Yoon, S.F.² Ahn, J.³ Milne, W.I.⁴

19
- 27544493510
- (1992) J. Appl. Phys , vol.72 , Issue.11 , pp. 5246
- Park, J.H.¹ Kwon, H.S.² Lee, J.Y.³

20
- 0032023165
- (1998) Surf. Coat. Technol , vol.100 , pp. 160
- Redondas, X.¹ Gonzalez, P.² Leon, B.³ Perez-amor, M.⁴

21
- 0027188676
- (1993) Thin Solid Films , vol.223 , pp. 114
- Laidani, N.¹ Capelletti, R.² Elena, M.³ Guzman, L.⁴

22
- 0029324305
- (1995) J. Mater. Sci , vol.30 , pp. 3130
- Hurwitz, F.I.¹ Kacik, T.A.² Bu, X.Y.³ Masnovi, J.⁴ Heimann, P.J.⁵

23
- 0032386483
- (1998) J. Vac. Sci. Technol A , vol.16 , Issue.2 , pp. 1
- Redondas, X.¹ Gonzalez, P.² Leon, B.³ Perez-amor, M.⁴

24
- 0000860209
- (1990) Mater. Res. Soc. Symp. Proc , vol.162 , pp. 439
- Basa, D.K.¹ Smith, F.W.²

25
- 0000802192
- (1999) Euro CVD XII Proceedings, J. Phys , vol.4 , pp. 1059
- Berjoan, R.¹ Biche, E.² Perarnau, D.³ Roualdes, S.⁴ Durand, J.⁵

26
- 0003492352
- (1990) J. Appl. Phys , vol.67 , Issue.10 , pp. 6521
- Harris, S.J.¹ Weimer, A.M.²

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