Chemical characterization of SiCxNy nanolayers by FTIR-and Raman spectroscopy, XPS and TXRF-NEXAFS

Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Volumn 603, Issue 1-2, 2009, Pages 174-177

  Baake, O ^a   Fainer, N I ^b   Hoffmann, P ^a   Kosinova, M L ^b   Rumyantsev, Yu M ^b   Trunova, V A ^b   Klein, A ^a   Ensinger, W ^a   Pollakowski, B ^c   Beckhoff, B ^c   Ulm, G ^c  

^a DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

^b NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

^c PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

Author keywords

Chemical bonding; Silicon carbonitride; Thin film; TXRF NEXAFS

Indexed keywords

CHEMICAL BONDING; CHEMICAL CHARACTERIZATIONS; FOURIER TRANSFORM INFRA-RED SPECTROSCOPIES; FTIR; GRAPHITIC CARBONS; NANO-LAYERS; NEAR-EDGE X-RAY ABSORPTION FINE STRUCTURES; REMOTE PLASMAS; SI-C BONDS; SI-N BONDS; SILICON CARBONITRIDE; STANDARD SAMPLES; TOTAL REFLECTION X-RAY FLUORESCENCES; TXRF-NEXAFS; X-RAY PHOTOELECTRON SPECTROSCOPIES; XPS;

ABSORPTION SPECTROSCOPY; CARBON NITRIDE; CHEMICAL BONDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAPHITE; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SILICON CARBIDE; SPECTROSCOPIC ANALYSIS; SPECTRUM ANALYSIS; THIN FILM DEVICES; THIN FILMS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 65449174981     PISSN: 01689002     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nima.2009.03.007     Document Type: Article

References (12)

1. Lehmann G., Hess P., Wu J.J., et al. Phys. Rev. 64 (2001) 165305
2. Chen L.C., Wu C.T., Wu J.J., and Chen K.H. Int. J. Mod. Phys. 14 (2000) 333
3. Ishimaru M., Naito M., Hirotsu Y., and Sickafus K.E. Nucl. Instr. and Meth. B 206 (2003) 994
4. N.I. Fainer, M.L. Kosinova, Yu.M. Rumyantsev, et al., ECS, PV 2003-08, vol. 2, 2003, pp. 1086-1093.
5. Fritsche J., Klein A., and Jaegermann W. Adv. Eng. Mater. 7 (2005) 914
6. Hoffmann P., Baake O., Beckhoff B., Ensinger W., Fainer N., Klein A., Kosinova M., Pollakowski B., Trunova V., Ulm G., and Weser J. Nucl. Instr. and Meth. A 575 (2007) 78
7. Vassallo E., Cremona A., Ghezzi F., et al. Appl. Surg. Sci. 252 (2006) 7993
8. Ferrari A.C., and Robertson J. Phys. Rev. B 61 (2000) 14095
9. Tuinstra F., and Koening J.L. J. Chem. Phys. 53 (1970) 1126
10. A. Klein, Unpublished data.
11. Chang Y.K., Hsieh H.H., Pong W.F., Tsai M.-H., Lee K.H., Dann T.E., Chien F.Z., Tseng P.K., Tsang K.L., Su W.K., Chen L.C., Wei S.L., Chen K.H., Bhusari D.M., and Chen Y.F. Phys. Rev. B 58 (1998) 9018
12. Yokoyama Y., Horiuchi K., Maeshima T., and Ohta T. Jpn. J. Appl. Phys. 33 (1994) 3488