Modelling of fluorine based high density plasma for the etching of silica glasses

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 29, Issue 5, 2011, Pages

  Lallement, Ludovic ^a   Rhallabi, Ahmed ^a   Cardinaud, Christophe ^a   Peignon Fernandez, Marie Claude ^a  

^a UNIVERSITÉ DE NANTES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CELLULAR MODEL; ETCHED SURFACE ROUGHNESS; ETCHING RATE; HIGH DENSITY PLASMAS; INPUT PARAMETER; ION SPECIES; METALLIC SITES; MONTE CARLO; OPERATING CONDITION; OUTPUT PARAMETERS; PLASMA KINETIC; PLASMA MODEL; REAL NUMBER; REDEPOSITION MECHANISM; SURFACE MODELS; UNIFORM CELLS;

ELECTRIC DISCHARGES; FLUORINE; FUSED SILICA; GLASS; INDUCTIVELY COUPLED PLASMA; MONTE CARLO METHODS; MORPHOLOGY; SULFUR HEXAFLUORIDE; SURFACE MORPHOLOGY; SURFACE ROUGHNESS; TWO DIMENSIONAL;

ETCHING;

EID: 80052411763     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3624786     Document Type: Article

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