Level set approach to anisotropic wet etching of silicon

Sensors

Volumn 10, Issue 5, 2010, Pages 4950-4967

  Radjenović, Branislav ^a   Radmilović Radjenović, Marija ^a   Mitrić, Miodrag ^b  

^a UNIVERSITY OF BELGRADE   (Serbia)

^b UNIVERSITY OF BELGRADE   (Serbia)

Author keywords

Etching; Level set; Profile evolution; Simulation

Indexed keywords

CELLULAR AUTOMATA METHOD; CONVEX CORNER COMPENSATIONS; INTERPOLATION TECHNIQUES; LEVEL SET; OPEN SOURCE IMPLEMENTATION; PROFILE EVOLUTION; SIMULATION; THREE DIMENSIONAL (3-D) MODELING;

ANISOTROPIC ETCHING; ANISOTROPY; DROP BREAKUP; ETCHING; HAMILTONIANS; IMAGE PROCESSING; LEVEL MEASUREMENT; NUMERICAL METHODS; THREE DIMENSIONAL; WET ETCHING;

SILICON;

EID: 77953514257     PISSN: 14248220     EISSN: None     Source Type: Journal    
DOI: 10.3390/s100504950     Document Type: Article

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