Heterogeneous recombination of atomic bromine and fluorine

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 1, 1999, Pages 282-290

  Kota, Gowri P ^a   Coburn, J W ^a   Graves, David B ^a  

^a University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033477008     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581582     Document Type: Article

References (40)

1. G. P. Kota, J. W. Coburn, and D. B. Graves, J. Vac. Sci. Technol. A 16, 2215 (1998).
2. S. P. Chang, J. C. Arnold, G. C. H. Zau, H.-S. Shin, and H. H. Sawin, J. Vac. Sci. Technol. A 15, 1853 (1997).
3. J. D. Bukowski, Ph.D. thesis, Department of Chemical Engineering, University of California at Berkeley, 1996.
4. C. Lee, M. A. Lieberman, and D. B. Graves, Plasma Chem. Plasma Process. 16, 99 (1996).
5. G. A. Hebner, J. Vac. Sci. Technol. A 14, 2158 (1996).
6. J. P. Chang, A. P. Mahorowala, and H. H. Sawin (unpublished).
7. G. P. Kota, J. W. Coburn, and D. B. Graves, J. Vac. Sci. Technol. A 16, 270 (1998).
8. K. Sinniah, M. G. Sherman, L. B. Lewis, W. H. Weinberg, J. T. Yates, Jr., and K. C. Janda, Phys. Rev. Lett. 62, 567 (1989).
9. K. Sinniah, M. G. Sherman, L. B. Lewis, W. H. Weinberg, J. T. Yates, Jr., and K. C. Janda, J. Chem. Phys. 92, 5700 (1990).
10. D. Pagnon, J. Amorin, J. Nahorny, M. Touzeau, and M. Vialle, J. Phys. D 28, 1856 (1995).
11. J. C. Greaves and J. W. Linnett, Trans. Faraday Soc. 54, 1323 (1958).
12. D. L. Flamm, Plasma Etching, edited by D. M. Manos and D. L. Flamm (Academic, San Diego, 1989), p. 115.
13. J. W. Linnett and D. G. H. Marsden, Proc. R. Soc. London, Ser. A 234, 489 (1956).
14. J. W. Linnett and D. G. H. Marsden, Proc. R. Soc. London, Ser. A 234, 504 (1956).
15. P. C. Nordine and J. D. LeGrange, AIAA J. 14, 644 (1976).
16. W. Muller-Markgraf and M. J. Rossi, J. Phys. Chem. 95, 825 (1991).
17. W. Muller-Markgraf and M. J. Rossi, Int. J. Chem. Kinet. 27, 403 (1995).
18. E. A. Ogryzlo, Can. J. Chem. 39, 2556 (1961).
19. E. A. Ogryzlo, J. Phys. Chem. 65, 191 (1961).
20. G. M. Schwab and H. Friess, Naturwissenschaften 21, 222 (1933).
21. G. M. Schwab and H. Friess, Z. Elektrochem. 39, 586 (1933).
22. G. M. Schwab, Z. Phys. Chem. Abt. B 27, 452 (1934).
23. M. C. Chuang and J. W. Coburn, J. Vac. Sci. Technol. A 8, 1969 (1990).
24. CRC Handbook of Chemistry and Physics, 74th ed., edited by R. C. Weast (Chemical Rubber, Boca Raton, FL, 1993).
25. L. D. B. Kiss and H. H. Sawin, J. Electrochem. Soc. 139, 1414 (1992).
26. A. D. Richards and H. H. Sawin, J. Appl. Phys. 62, 799 (1987).
27. J. W. Coburn, J. Vac. Sci. Technol. B 12, 1384 (1994).
28. J. R. Engstrom, M. M. Nelson, and T. Engel, Surf. Sci. 215, 437 (1989).
29. N. Layadi, V. M. Donnelly, and J. T. C. Lee, J. Appl. Phys. 81, 6738 (1997).
30. E. J. Jumper, C. J. Ultee, and E. A. Dorko, J. Phys. Chem. 84, 41 (1980).
31. M. E. Barone and D. B. Graves, J. Appl. Phys. 78, 6604 (1995).
32. L. Brewer and J. B. Tellinhuisen, J. Chem. Phys. 54, 5133 (1971).
33. B. A. Helmer, Ph.D. thesis, Department of Chemical Engineering, University of California at Berkeley, 1998.
34. G. P. Kota, J. W. Coburn, and D. B. Graves, J. Appl. Phys. (to be published).
35. M. J. Vasile and F. A. Stevie, J. Appl. Phys. 53, 3799 (1982).
36. K. Ninomiya, K. Suzuki, S. Nishimatsu, and O. Okada, J. Appl. Phys. 58, 1177 (1985).
37. D. L. Flamm, V. M. Donnelly, and J. A. Mucha, J. Appl. Phys. 52, 3633 (1981).
38. S. Tachi, K. Tsujimoto, and S. Okudaira, Appl. Phys. Lett. 52, 616 (1988).
39. C. B. Mullins and J. W. Coburn, J. Appl. Phys. 76, 7562 (1994).
40. L. D. B. Kiss and H. H. Sawin, Plasma Chem. Plasma Process. 12, 523 (1992).