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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 4, 2001, Pages 1294-1297

Ion compositions and energies in inductively coupled plasmas containing SF6

(3) Goyette, A N a Wang, Y a Olthoff, J K a

a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BINARY MIXTURES; CONCENTRATION (PROCESS); CURRENT DENSITY; DISSOCIATION; GROUNDING ELECTRODES; MASS SPECTROMETRY; OXIDATION; POSITIVE IONS; QUARTZ APPLICATIONS; SULFUR COMPOUNDS;

GASEOUS ELECTRONIC CONFERENCE (GEC) RADIO FREQUENCY REFERENCE CELLS; ION ENERGY DISTRIBUTIONS; ION FLUX;

INDUCTIVELY COUPLED PLASMA;

EID: 0035391121 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1330261 Document Type: Article

Times cited : (22)

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