A three-dimensional model for inductively coupled plasma etching reactors: Azimuthal symmetry, coil properties, and comparison to experiments

Journal of Applied Physics

Volumn 80, Issue 3, 1996, Pages 1337-1344

  Kushner, Mark J ^a   Collison, Wenli Z ^a,b   Grapperhaus, Michael J ^a   Holland, John P ^b   Barnes, Michael S ^b  

^a United States of America   (United States)

^b LAM RESEARCH CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000451451     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.362932     Document Type: Article

References (15)

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