Rectangular channels for lab-on-a-chip applications

Microelectronic Engineering

Volumn 67-68, Issue , 2003, Pages 865-871

  Ceriotti, L ^a   Weible, K ^b   De Rooij, N F ^a   Verpoorte, E ^a  

^a UNIVERSITY OF NEUCHÂTEL   (Switzerland)

^b Weible OpTech   (Switzerland)

Author keywords

Fused silica; Poly(dimethylsiloxane); Reactive ion etching; Rectangular channel

Indexed keywords

DRY ETCHING; ELECTROPHORESIS; FUSED SILICA; INDUCTIVELY COUPLED PLASMA; MASKS; OPTICAL FIBERS; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION;

MICROCHANNELS;

MICROPROCESSOR CHIPS;

EID: 0038696430     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00148-5     Document Type: Conference Paper

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