Model-based analysis of the silica glass film etch mechanism in CF 4/O 2 inductively coupled plasma

Journal of Materials Science: Materials in Electronics

Volumn 19, Issue 10, 2008, Pages 957-964

  Kim, Mansu ^a   Min, Nam Ki ^a   Efremov, Alexander ^b   Lee, Hyun Woo ^c   Park, Chi Sun ^c   Kwon, Kwang Ho ^a  

^a Korea University   (South Korea)

^b IVANOVO STATE UNIVERSITY OF CHEMISTRY AND TECHNOLOGY   (Russian Federation)

^c Hanseo University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ER-DOPED; MODEL-BASED ANALYSIS; SILICA GLASSES;

ERBIUM; FUSED SILICA; GLASS; SILICA; SILICATE MINERALS; SILICON COMPOUNDS;

MODAL ANALYSIS;

EID: 46849119789     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-007-9425-z     Document Type: Article

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