Study of a HPPMS discharge in Ar/O2 mixture: I. Discharge characteristics with Ru cathode

Plasma Sources Science and Technology

Volumn 18, Issue 4, 2009, Pages

  Benzeggouta, D ^a   Hugon, M C ^a   Bretagne, J ^a   Ganciu, M ^a,b  

^a UNIVERSITÉ PARIS SUD   (France)

^b NATIONAL INSTITUTE FOR LASER   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

IONIZATION OF GASES; RUTHENIUM COMPOUNDS;

CONDUCTIVE OXIDES; DISCHARGE CHARACTERISTICS; ELECTRON ATTACHMENT; HIGH POWER PULSED MAGNETRON SPUTTERING; HIGH-CURRENT DISCHARGES; HIGH-IONIZATION; REACTIVE CONDITION; SPUTTERED SPECIES;

RUTHENIUM;

EID: 70350641388     PISSN: 09630252     EISSN: 13616595     Source Type: None    
DOI: 10.1088/0963-0252/18/4/045025     Document Type: Article

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