Modeling the flux of high energy negative ions during reactive magnetron sputtering

Journal of Applied Physics

Volumn 106, Issue 9, 2009, Pages

  Mahieu, S ^a   Leroy, W P ^a   Van Aeken, K ^a   Depla, D ^a  

^a GHENT UNIVERSITY   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

BINARY COLLISIONS; ENERGY-RESOLVED MASS SPECTROMETRY; EXPERIMENTAL OBSERVATION; HIGH ENERGY; HIGH-ENERGY IONS; MASS DISTRIBUTION; MONTE CARLO SIMULATION; REACTIVE MAGNETRON SPUTTERING; SECONDARY ELECTRON EMISSIONS; SIMULATED DISTRIBUTION; TWO PARAMETER;

ALGEBRA; ANGULAR DISTRIBUTION; HIGH ENERGY PHYSICS; MASS SPECTROMETRY; MONTE CARLO METHODS; NEGATIVE IONS; ROTATION; SECONDARY EMISSION; SIMULATORS; WORK FUNCTION;

MAGNETRONS;

EID: 70450277134     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3247545     Document Type: Article

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