On the phase formation of sputtered hafnium oxide and oxynitride films

Journal of Applied Physics

Volumn 108, Issue 1, 2010, Pages

  Sarakinos, K ^a   Music, D ^a   Mraz S ^a   To Baben, M ^a   Jiang, K ^a   Nahif, F ^a   Braun, A ^a   Zilkens, C ^a   Konstantinidis, S ^b   Renaux, F ^c   Cossement, D ^c   Munnik, F ^d   Schneider, J M ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b UNIVERSITY OF MONS   (Belgium)

^c MATERIA NOVA RESEARCH CENTER   (Belgium)

^d INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITED FILMS; DEPOSITION OF FILMS; DIRECT CURRENT MAGNETRON SPUTTERING; EXPERIMENTAL STRATEGY; GROWING FILMS; HAFNIUM OXYNITRIDE FILMS; HIGH POWER PULSED MAGNETRON SPUTTERING; ION FLUXES; MONOCLINIC HFO; OXYNITRIDE FILMS; PHASE FORMATIONS; PLASMA ANALYSIS; STRUCTURAL CHARACTERIZATION; SUB-LATTICES; TARGET COVERAGE; TARGET POTENTIAL; TARGET SURFACE; TETRAGONAL HFO; TRANSITION ZONES;

CRYSTAL STRUCTURE; FILM GROWTH; HAFNIUM; ION BOMBARDMENT; IONS; NITRIDES; OXIDE FILMS; OXIDES; STABILIZATION; TARGETS;

HAFNIUM OXIDES;

EID: 77955216871     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3437646     Document Type: Article

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