Noble gas retention in the target during rotating cylindrical magnetron sputtering

Applied Physics Letters

Volumn 93, Issue 6, 2008, Pages

  Mahieu, S ^a   Leroy, W P ^a   Depla, D ^a   Schreiber, S ^b   Moller W ^b  

^a GHENT UNIVERSITY   (Belgium)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

INERT GASES; MAGNETRONS; ROTATION; SPUTTER DEPOSITION; XENON;

CYLINDRICAL MAGNETRON SPUTTERING; NOBLE GAS;

MAGNETRON SPUTTERING;

EID: 49749107092     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2970037     Document Type: Article

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