Atomic Layer Deposition of Ru and RuO2 for MIMCAP Applications

ECS Transactions

Volumn 25, Issue 4, 2009, Pages 377-387

  Zhao, C ^a   Pawlak, M A ^a   Popovici, M ^a   Schaekers, M ^a   Sleeckx, E ^a   Vancoille, E ^a   Wouters, D J ^a   Tokei, Zs ^a   Kittl, J A ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; HIGH-K DIELECTRIC; PLASMA APPLICATIONS; RUTHENIUM COMPOUNDS; STRONTIUM TITANATES; SUBSTRATES; SURFACE TREATMENT; TITANIUM NITRIDE;

COREACTANTS; DEPOSITION BEHAVIOR; LINEAR GROWTH; METAL CAPACITORS; PLASMA TREATMENT; RUTHENIUM OXIDE; SHORT INCUBATIONS; SI SUBSTRATES;

ATOMIC LAYER DEPOSITION;

EID: 74249091987     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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