Kinetics of the ruthenium thin film deposition from supercritical carbon dioxide by the hydrogen reduction of Ru(tmhd)2cod

Microelectronic Engineering

Volumn 87, Issue 4, 2010, Pages 566-572

  Karanikas, Christos F ^a   Watkins, James J ^b  

^a University of Massachusetts   (United States)

^b UNIVERSITY OF MASSACHUSETTS   (United States)

Author keywords

Kinetics; Ruthenium; Supercritical fluid deposition; Thin film

Indexed keywords

APPARENT ACTIVATION ENERGY; CONFORMAL DEPOSITION; CYCLOOCTANES; CYCLOOCTENE; DEPOSITION KINETICS; DEPOSITION TEMPERATURES; EXCESS HYDROGEN; FIRST ORDER; FIRST ORDER EFFECT; HIGH ASPECT RATIO; HYDROGEN REDUCTION; NEGATIVE IMPACTS; PRECURSOR CONCENTRATION; REACTION BYPRODUCTS; REACTION PRESSURE; REACTION TEMPERATURE; SECOND ORDERS; SUPERCRITICAL CARBON DIOXIDES; SUPERCRITICAL FLUID DEPOSITION; TETRAMETHYL; THIN-FILM DEPOSITIONS; ZERO ORDER; ZERO ORDER DEPENDENCE;

ACTIVATION ENERGY; ASPECT RATIO; CARBON DIOXIDE; CARBON MONOXIDE; CONCENTRATION (PROCESS); EFFLUENT TREATMENT; FILM GROWTH; GROWTH KINETICS; GROWTH RATE; HYDROGEN; PRESSURE EFFECTS; RUTHENIUM; SUPERCRITICAL FLUID EXTRACTION; SUPERCRITICAL FLUIDS; THIN FILM DEVICES; THIN FILMS;

DEPOSITION;

EID: 75149121390     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.08.011     Document Type: Article

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