Characterization of asymmetric rhombohedral twin in epitaxial α-Cr2O3 thin films by X-ray and electron diffraction

Thin Solid Films

Volumn 515, Issue 11, 2007, Pages 4570-4579

  Mändar, Hugo ^a   Uustare, Teet ^a   Aarik, Jaan ^a   Tarre, Aivar ^a   Rosental, Arnold ^a  

^a UNIVERSITY OF TARTU   (Estonia)

Author keywords

Asymmetric rhombohedral twin; Atomic layer deposition (ALD); Chromium oxide; Epitaxy

Indexed keywords

ATOMS; CHEMICAL ANALYSIS; CHROMIUM COMPOUNDS; ELECTRON DIFFRACTION; EPITAXIAL GROWTH; HIGH ENERGY ELECTRON DIFFRACTION; X RAY DIFFRACTION; X RAYS;

ASYMMETRIC RHOMBOHEDRAL TWIN; ATOMIC LAYER DEPOSITION; ATOMIC LAYER DEPOSITION (ALD); CHROMIUM OXIDE;

THIN FILMS;

EID: 33847143722     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.11.037     Document Type: Article

References (71)

1. G.V., Samsonov, The Oxide Handbook, 2nd ed., IFI/Plenum, New York, 1982, pp. 192, 195.
2. Colson J.C., and Larpin J.P. Mater. Res. Soc. Bull. 10 (1994) 23
3. Bhushan B., Theunissen G.S.A.M., and Li X. Thin Solid Films 311 (1997) 67
4. Bhushan B., and Gupta B.K. Handbook of Tribology: Materials, Coatings and Surface Treatments (1991), McGraw-Hill, New York 14.1
5. Bratkovsky A.M. Phys. Rev., B 56 (1997) 2344
6. Cheng R., Komesu T., Jeong H.-K., Yuan L., Lioua S.-H., Doudin B., Dowben P.A., and Losovyj Ya.B. Phys. Lett., A 302 (2002) 211
7. Hutchins M.G. Surf. Technol. 20 (1983) 301
8. Lai F.D., Huang C.Y., Chang C.M., Wang L.A., and Cheng W.C. Microelectron. Eng. 67-68 (2003) 17
9. Cantalini C. J. Eur. Ceram. Soc. 24 (2004) 1421
10. Shaw G.A., Pratt K.F.E., Parkin I.P., and Williams D.E. Sens. Actuators, B 104 (2005) 151
11. Miremadi B.K., Singh R.C., Chen Z., Morrison S.R., and Colbow K. Sens. Actuators, B 21 (1994) 1
12. Robbert P.S., Geisler H., Ventrice C.A., van Ek J., Chaturvedi S., Rodriguez J.A., Kuhn M., and Diebold U. J. Vac. Sci. Technol., A 16 (1998) 990
13. Yim S.D., and Nam I.-S. J. Catal. 221 (2004) 601
14. Connor W.C., and Kokes R.J. J. Phys. Chem. 73 (1969) 2436
15. Maruyama T., and Akagi H. J. Electrochem. Soc. 143 (1996) 1955
16. Ito Y., Kushida K., and Takeuchi H. J. Cryst. Growth 112 (1991) 427
17. Jin P., Nakao S., Wang S.X., and Wang L.M. Appl. Phys. Lett. 82 (2003) 1024
18. Andersson J.M., Czigány Zs., Jin P., and Helmersson U. J. Vac. Sci. Technol., A 22 (2004) 117
19. Abass A.K., and Jaboori E.M. Phys. Status Solidi, A 116 (1989) K111
20. Zhang L., Kuhn M., and Diebold U. Surf. Sci. 375 (1997) 1
21. Stierle A., Koll Th., and Zabel H. Phys. Rev., B 58 (1998) 5062
22. Hones P., Diserens M., and Lévy F. Surf. Coat. Technol. 120-121 (1999) 277
23. Ashenford D.E., Long F., Hagston W.E., Lunn B., and Matthews A. Surf. Coat. Technol. 116-119 (1999) 699
24. Chambers S.A., Williams J.R., Henderson M.A., Joly A.G., Varela M., and Pennycook S.J. Surf. Sci. 587 (2005) L197
25. Popovici N., Paramês M.L., Da Silva R.C., Monnereau O., Sousa P.M., Silvestre A.J., and Conde O. Appl. Phys., A 79 (2004) 1409
26. Jantson T., Avarmaa T., Mändar H., Uustare T., and Jaaniso R. Sens. Actuators, B 109 (2005) 24
27. Dho J., Blamire M.G., and Chi E.O. Phys. Rev., B 72 (2005) 224421
28. Sousa P.M., Silvestre A.J., Popovici N., and Conde O. Appl. Surf. Sci. 247 (2005) 423
29. Carta G., Natali M., Rossetto G., Zanella P., Salmaso G., Restello S., Rigato V., Kaciulis S., and Mezzi A. Chem. Vap. Depos. 11 (2005) 375
30. Mota A.F., Silvestre A.J., Sousa P.M., Conde O., Rosa M.A., and Godinho M. Mater. Sci. Forum 514-516 (2006) 284
31. Qian Y.-T., Kershaw R., Dwight K., and Wold A. Mater. Res. Bull. 25 (1990) 1243
32. Aleskovskii V.B., and Drozd V.E. Acta Polytech. Scand., Chem. Technol. 195 (1990) 155
33. Kytökivi A., Jacobs J.-P., Hakuli A., Meriläinen J., and Brongersma H.H. J. Catal. 162 (1996) 190
34. Bender M., Ehrlich D., Yakovkin I.N., Rohr F., Bäumer M., Kuhlenbeck H., Freund H.-J., and Staemmler V. J. Phys., Condens. Matter 7 (1995) 5289
35. Maurice V., Cadot S., and Marcus P. Surf. Sci. 458 (2000) 195
36. Chambers S.A., and Droubay T. Phys. Rev., B 64 (2001) 075410
37. Zhang L., Kuhn M., and Diebold U. J. Vac. Sci. Technol., A 15 (1997) 1576
38. 2 substrates, MSc Thesis, University of Maine, USA, 2002, www.library.umaine.edu/theses/pdf/ChoY2002.pdf/.
39. Lawrence P.J., Parker S.C., and Tasker P.W. J. Am. Ceram. Soc. 71 (1988) C389
40. Rowley A.J., Wilson M., and Madden P.A. J. Phys., Condens. Matter 11 (1999) 1903
41. Scarano D., Spoto G., Bordiga S., Ricchiardi G., and Zecchina A. J. Electron Spectrosc. Relat. Phenom. 64-65 (1993) 307
42. Kaminow I.P., Turner E.H., Barns R.L., and Bernstein J.L. J. Appl. Phys. 51 (1980) 4379
43. Henrich V.E. Rep. Prog. Phys. 48 (1985) 1481
44. Toledano D.S., Metcalf P., and Henrich V.E. Surf. Sci. 472 (2001) 21
45. York S.C., Abee M.W., and Cox D.F. Surf. Sci. 437 (1999) 386
46. Niemeyer D., Williams D.E., Smith P., Pratt K.F.E., Slater B., Catlow C.R.A., and Stoneham A.M. J. Mater. Chem. 12 (2002) 667
47. Niilisk A., Rosental A., Uustare T., Kasikov T., and Tarre A. J. Phys. IV 11 (2001) 103
48. Mändar H., Felsche J., Mikli V., and Vajakas T. J. Appl. Crystallogr. 32 (1999) 345
49. Parratt L.G. Phys. Rev. 95 (1954) 359
50. Keller E. J. Appl. Crystallogr. 22 (1989) 19
51. Toebbens D.M., Stuesser N., Knorr K., Mayer H.M., and Lampert G. Mater. Sci. Forum 378 (2001) 288
52. Sawada H. Mater. Res. Bull. 29 (1994) 239
53. Segmüller A. Adv. X-Ray Anal. 29 (1986) 353
54. Scherrer P. Nachr. Ges. Wiss. Gött., Math.-Phys. Kl (1918) 98
55. Nolder R., and Cadoff I. Trans. Metallurg. Soc. AIME 233 (1965) 549
56. Bursill L.A., and Withers R.L. Philos. Mag., A 40 (1979) 213
57. Shiue Y.R., and Phillips D.C. Philos. Mag., A 50 (1984) 225
58. Guo J., Ellis D.E., and Lam D.J. Phys. Rev., B 45 (1992) 13647
59. Marinopoulos A.G., and Elsässer C. Acta Mater. 48 (2000) 4375
60. Rehbein C., Michel F., Harrison N.M., and Wander A. Surf. Rev. Lett. 5 (1998) 337
61. Kronberg M.L. Acta Metall. 5 (1957) 507
62. Shannon R.D. Acta Crystallogr., A 32 (1976) 751
63. Schönberg N. Acta Chem. Scand. 8 (1954) 221
64. Bondybey V.E., and English J.H. Chem. Phys. Lett. 94 (1983) 443
65. Heuer A.H. Philos. Mag. 13 (1966) 379
66. Heuer A.H., Lagerlöf K.P.D., and Castaing J. Philos. Mag., A 78 (1998) 747
67. Nufer S., Marinopoulos A.G., Gemming T., Elsässer C., Kurtz W., Köstlmeier S., and Rühle M. Phys. Rev. Lett. 86 (2001) 5066
68. Castaing J., Muñoz A., and Dominiguez Rodriguez A. Philos. Mag., A 82 (2002) 1419
69. Grimmer H., and Nespolo M. Z. Kristallogr. 221 (2006) 28
70. Grimmer H., and Kunze K. Acta Crystallogr., A 60 (2004) 220
71. Yamaguchi I., Manabe T., Kumagai T., Kondo W., and Mizuta S. Thin Solid Films 365 (2000) 36