The effect of an iodine source on nucleation and film properties of Ru films deposited by chemical vapor deposition

Thin Solid Films

Volumn 518, Issue 1, 2009, Pages 36-42

  Thom, Kelly M ^a   Ekerdt, J G ^a  

^a The University of Texas at Austin   (United States)

Author keywords

Chemical vapor deposition; Film roughness; Iodine; Nucleation; Ruthenium

Indexed keywords

FILM PROPERTIES; FILM ROUGHNESS; GROWING FILMS; ROOT MEAN SQUARE ROUGHNESS; RU FILM;

CARBON FILMS; FILM GROWTH; INDUSTRIAL CHEMICALS; IODINE; NUCLEATION; OXYGEN SUPPLY; RUTHENIUM; VAPORS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL VAPOR DEPOSITION;

EID: 69549110081     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.06.006     Document Type: Article

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