Evaluation of ruthenium precursors for thin-film applications

Proceedings - Electrochemical Society

Volumn PV 2005-05, Issue , 2005, Pages 389-396

  Hoover, Cynthia A ^a   Thompson, David M ^a   Geary, Joan E ^a   Natwora Jr , James P ^a   Litwin, Michael M ^a   Peck, John ^a  

^a PRAXAIR INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; RUTHENIUM FILMS;

CHEMICAL VAPOR DEPOSITION; OXYGEN; SCANNING ELECTRON MICROSCOPY; SYNTHESIS (CHEMICAL); THIN FILMS;

RUTHENIUM;

EID: 31844436895     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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