Improvements in growth behavior of CVD Ru films on film substrates for memory capacitor integration

Journal of the Electrochemical Society

Volumn 152, Issue 1, 2005, Pages

  Kang, Sang Yeol ^a   Hwang, Cheol Seong ^a   Kim, Hyeong Joon ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; DIELECTRIC FILMS; GROWTH (MATERIALS); METALLORGANIC CHEMICAL VAPOR DEPOSITION; NUCLEATION; OXIDATION; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

FILM SUBSTRATES; MEMORY CAPACITOR INTEGRATION; OXIDIZING ATMOSPHERE; PLASMA TREATMENT;

RUTHENIUM;

EID: 12744274672     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1827595     Document Type: Article

References (13)

1. Y. Matsui, M. Hiratani, T. Nabatame, Y. Shimamoto, and S. Kimura, Electrochem. Solid-State Lett., 4, C9 (2001).
2. J. W. Lee, K.-M. Kim, H.-S. Song, K.-C. Jeong, J. M. Lee, and J. S. Roh, Jpn. J. Appl. Phys., Part 1, 40, 5201 (2001).
3. Y. Matsui, M. Hiratani, T. Nabatame, Y. Shimamato, and S. Kimura, Electrochem. Solid-State Lett., 5, C18 (2002).
4. K. Ono, T. Horikawa, T. Shibano, N. Mikami, T. Kuroiwa, T. Kawahara, S. Matsuno, F. Uchikiwa, S. Satoh, and H. Abe, Tech. Dig. - Int. Electron Devices Meet., 1998, 803.
5. W.-D. Kim, J.-H. Joo, Y.-K. Jeong, S.-J. Won, S.-Y. Park, S.-C. Lee, C.-Y. Yoo, S.-T. Kim, and J.-T. Moon, Tech. Dig. - Int. Electron Devices Meet., 2001, 12.1.1.
6. S. Y. Kang, H. J. Lim, C. S. Hwang, and H. J. Kim, J. Electrochem. Soc., 149, C317 (2002).
7. S. Y. Kang, H. J. Lim, C. S. Hwang, and H. J. Kim, J. Korean Phys. Soc., 44(1), 25 (2004).
8. S. Y. Kang, K. H. Choi, S. K. Lee, C. S. Hwang, and H. J. Kim, J. Electrochem. Soc., 147, 1161 (2000).
9. K. C. Smith, Y.-M. Sun, N. R. Mettlach, R. L. Hance, and J. M. White, Thin Solid Films, 376, 73 (2000).
10. I. Bertóti, A. Tóth, and M. Menyhard, in Handbook of Surface and Interface Analysis, J. C. Rivière and S. Myhra, Editors, Chap. 8, Marcel Dekker, Inc., New York (1998).
11. S.-E. Park, H.-M. Kim, K.-B. Kim, and S.-H. Min, Electrochem. Solid-State Lett., 1, 262 (1998).
12. M. Eizenberg, MRS Bull., 427, 325 (1996).
13. J. F. Moulder, W. F. Stickle, P. E. Sobol, and K. D. Bomben, in Handbook of X-Ray Photoelectron Spectroscopy, J. Chastain, Editor, Perkin-Elmer, Reading, MA (1992).