Observation of inverse reactive ion etching lag for silicon dioxide etching in inductively coupled plasmas

Applied Physics Letters

Volumn 68, Issue 1, 1996, Pages 10-12

  Doemling, M F ^a   Rueger, N R ^a   Oehrlein, G S ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0005208812     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116772     Document Type: Article

References (10)

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