Simulation of inverse reactive ion etching lag

Vacuum

Volumn 72, Issue 1, 2003, Pages 53-57

  Knizikevicius R ^a  

^a KAUNAS UNIVERSITY OF TECHNOLOGY   (Lithuania)

Author keywords

Fluorocarbon plasma; Inverse RIE lag; Silicon

Indexed keywords

ADSORPTION; CHEMICAL ACTIVATION; COMPOSITION; DESORPTION; MICROSTRUCTURE; PASSIVATION; PLASMAS; REACTION KINETICS; SPUTTER DEPOSITION; SURFACE REACTIONS;

STOCHASTIC MIXING;

REACTIVE ION ETCHING;

EID: 0042031174     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(03)00099-X     Document Type: Article

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