Roughness formation during plasma etching of composite materials: A kinetic Monte Carlo approach

IEEE Transactions on Plasma Science

Volumn 35, Issue 5 I, 2007, Pages 1359-1369

  Zakka, Eleni ^a   Constantoudis, Vassilios ^a   Gogolides, Evangelos ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

Composite materials; Monte Carlo methods; Plasma etching; Roughness

Indexed keywords

COMPUTER SIMULATION; MONTE CARLO METHODS; SPUTTERING; SURFACE ROUGHNESS; VOLUME FRACTION;

DYNAMIC TRANSITION; ETCH RATE; POWER LAW;

PLASMA ETCHING;

EID: 35348920633     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2007.906135     Document Type: Article

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