Surface roughening of silicon, thermal silicon dioxide, and low- k dielectric coral films in argon plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 26, Issue 1, 2008, Pages 151-160

  Yin, Yunpeng ^a   Sawin, Herbert H ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CORAL FILMS; ION ENERGY; ION IMPINGEMENT ANGLE; ION INCIDENT ANGLE; PLASMA CHEMISTRY;

ARGON; ATOMIC FORCE MICROSCOPY; INDUCTIVELY COUPLED PLASMA; ION BOMBARDMENT; SILICA; SURFACE ROUGHNESS;

DIELECTRIC FILMS;

EID: 37849005054     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2821747     Document Type: Article

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