Advanced source/drain technologies for parasitic resistance reduction

IWJT-2010: Extended Abstracts - 2010 International Workshop on Junction Technology

Volumn , Issue , 2010, Pages 57-61

  Yeo, Yee Chia ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

DEVICE ARCHITECTURES; DRIVE CURRENTS; FUTURE TECHNOLOGIES; HOLE BARRIER; METAL SILICIDE; MOS-FET; PARASITIC RESISTANCES; SOURCE/DRAIN REGIONS; TECHNOLOGY SOLUTIONS;

CONTACT RESISTANCE; SILICIDES; TECHNOLOGY;

MOSFET DEVICES;

EID: 77954249376     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IWJT.2010.5474988     Document Type: Conference Paper

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