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Volumn 86, Issue 6, 2005, Pages 1-3
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Tuning of NiSiSi Schottky barrier heights by sulfur segregation during Ni silicidation
a a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
INTERFACES (MATERIALS);
SEGREGATION (METALLOGRAPHY);
SULFUR;
SCHOTTKY BARRIER HEIGHT (SBH);
SILICIDESILICON INTERFACES;
SEMICONDUCTOR METAL BOUNDARIES;
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EID: 18744368540
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1863442 Document Type: Article |
Times cited : (143)
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References (15)
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